HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6..

HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)| 基本信息更多信息

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英文名称:	HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
英文同义词:	HAFNIUM(IV) OXIDE SPUTTERING TARGET, 101.4MM (4.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95% (METALS BASIS EXCLUDING ZR)
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分子式:	HfO2
分子量:	210.4888
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