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- CAS号:
- 英文名:
- Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)
- 英文别名:
- Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis;Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)
- 中文名:
- 氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
- 中文别名:
- 氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,;氧化铪(IV)溅射靶, 76.2MM (3.0IN) 直径 X 6.35MM (0.25IN) 厚, 99.95 (METALS BASIS 去除 ZR);氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95 (METALS BASIS EXCLUDING ZR)
- CBNumber:
- CB51569112
- 分子式:
- HfO2
- 分子量:
- 210.4888
- MOL File:
- Mol file
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