ChemicalBook
English   Japanese   Germany   Korea

碳化钽

碳化钽, 12070-07-4, 结构式
碳化钽
CAS号:
12070-07-4
英文名:
TANTALUM CARBIDE
英文别名:
Einecs 235-119-9;ditantalum monocarbide;Tantalum carbide (ta2C);Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis);Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
中文名:
碳化钽
中文别名:
碳化钽溅射靶,50.8MM(2.0IN)DIAX3.18MM(0.125IN)THICK,99.5%(METALSBASIS);碳化钽溅射靶76.2MM(3.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASIS);碳化钽溅射靶,76.2MM(3.0IN)DIAX3.18MM(0.125IN)THICK,99.95%(METALSBASIS);碳化钽溅射靶,50.8MM(2.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASIS);碳化钽溅射靶, 76.2MM (3.0IN) 直径 X 3.18MM (0.125IN) 厚, 99.5%(METALS BASIS);碳化钽溅射靶,50.8MM (2.0IN)直径 X 6.35MM (0.250IN)厚,99.5%(METALS BASIS)BASIS)
CBNumber:
CB8325802
分子式:
CTa
分子量:
192.96
MOL File:
12070-07-4.mol

碳化钽化学性质

熔点:
3327°C
密度:
15.100
形态:
refractory hexagonal crystals
颜色:
refractory hexagonal, hexane crystals, crystalline
电阻率 (resistivity):
80.0 (ρ/μΩ.cm)
晶体结构:
Hexagonal
EPA化学物质信息:
Tantalum carbide (Ta2C) (12070-07-4)
安全信息
WGK Germany: 3

碳化钽性质、用途与生产工艺

碳化钽 上下游产品信息

上游原料

下游产品


碳化钽 生产厂家

全球有 4家供应商   碳化钽国内生产厂家
供应商联系电话电子邮件国家产品数优势度
Hubei xin bonus chemical co. LTD 86-13657291602 linda@hubeijusheng.com 中国 22968 58
武汉吉鑫益邦生物科技有限公司 027-59768661 13297943853 1704244976@qq.com 中国 5020 58
 

12070-07-4, 碳化钽 相关搜索:

  • Catalysis and Inorganic Chemistry
  • Tantalum
  • 碳化钽溅射靶,76.2MM(3.0IN)DIAX3.18MM(0.125IN)THICK,99.95%(METALSBASIS)
  • 碳化钽溅射靶,50.8MM(2.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASIS)
  • 碳化钽溅射靶,50.8MM(2.0IN)DIAX3.18MM(0.125IN)THICK,99.5%(METALSBASIS)
  • 碳化钽溅射靶76.2MM(3.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASIS)
  • 碳化钽溅射靶,50.8MM (2.0IN)直径 X 6.35MM (0.250IN)厚,99.5%(METALS BASIS)BASIS)
  • 碳化钽溅射靶, 76.2MM (3.0IN) 直径 X 3.18MM (0.125IN) 厚, 99.5%(METALS BASIS)
  • 12070-07-4
  • Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basi
  • Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi
  • Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi
  • ditantalum monocarbide
  • Tantalum carbide (ta2C)
  • Einecs 235-119-9
  • Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
  • Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
Copyright 2016 © ChemicalBook. All rights reserved