2,2,3,4,4,4-Hexafluorobutyl methacrylate

2,2,3,4,4,4-HEXAFLUOROBUTYL METHACRYLATE 1H,1H,3H-HEXAFLUOROBUTYL METHACRYLATE DAIKIN M-7310 2,2,3,4,4,4-Hexafluorobut-1-yl 2-methylprop-2-enoate 2,2,3,4,4,4-Hexafluorobut-1-yl methacrylate 99% 2,2,3,4,4 2,2,3,4,4,4-Hexafluorobutyl Methacrylate (stabilized with MEHQ) 2-Propenoic acid,2-methyl-, 2,2,3,4,4,4-hexafluorobutyl ester methacrylic acid 2,2,3,4,4,4-hexafluorobutyl ester 2,2,3,4,4,4-Hexafluorobutyl methacrylate 99% 2,2,3,4,4,4-Hexafluorobutylmethacrylate99% 2-Propenoic acid,2-methyl-,2,2,3,4,4,4-hexafluorobuthyl ester 2-METHYL-ACRYLIC ACID 2,2,3,4,4,4-HEXAFLUORO-BUTYL ESTER 2,2,3,4,4,4-HEXAFLUOROBUTYL METHACRYLATE, 98%, STABILIZED 2,2,3,4,4,4-Hexafluorobutyl methacrylate, stabilized 2,2,3,4,4,4-Hexafluorobutyl methacrylate, 96%, stab. HFBMA Hexafluorobutyl methacrylate 2,2,3,4,4,4-HexafL Actyflon-G02 2,2,3,4,4,4-Hexafluorobutyl 2-methyl-2-propenoate 2,2,3,4,4,4-Hexafluorobutyl methacrylate, 96%, stablized with 30-70 ppm MEHQ 2,2,3,4,4,4-Hexafluoro-butyl 2-methylacrylate 36405-47-7 C8F6H8O2 CH2CCH3COOCH2CF2CFHCF3 C8H8F6O2 Esters Organic Building Blocks Building Blocks Carbonyl Compounds C8 to C9 Acrylic Monomers Building Blocks C8 to C9 Carbonyl Compounds Chemical Synthesis Contact Printing Fluorinated Acrylics Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers Lithography Monomers Low Refractive Index Monomers monomer C8 to C9Monomers Fluorine-Containing Monomers for 157 nm UV Lithography Resist PolymersPhotonic and Optical Materials Low Refractive Index Monomers Acrylic Monomers Carbonyl Compounds Esters Fluorinated AcrylicsSelf Assembly&Contact Printing Lithography Monomers Waveguide Materials Materials Science Micro/NanoElectronics Monomers Organic and Printed Electronics Organic Building Blocks Photonic and Optical Materials