2816-43-5(TRIPHENYLGERMANE) Product Description

2816-43-5

CAS No.2816-43-5

Chemical Name:TRIPHENYLGERMANE

CBNumber:CB6423621

Molecular Formula:C18H16Ge

Formula Weight:304.96

MOL File:Mol file

TRIPHENYLGERMANE Synonyms:

GERMANIUM TRIPHENYL
TRIPHENYLGERMANIUM HYDRIDE
TRIPHENYLGERMANE
TRIPHENYL GERMANIUM
Triphenylgermanyl hydride
Germane, triphenyl-
TRIPHENYLGERMANE ISO 9001：2015 REACH

TRIPHENYLGERMANE Property

Melting point:	40-43 °C (lit.)
Boiling point:	128-9°C 0,03mm
refractive index	1.6187
Flash point:	>110°C
Hydrolytic Sensitivity	4: no reaction with water under neutral conditions

Safety

Hazard Codes :	Xn
Risk Statements :	20/21/22
Safety Statements :	36
WGK Germany :	3
TSCA :	No

TRIPHENYLGERMANE Suppliers

Global( 45)Suppliers

Supplier	Tel	Email	Country	ProdList	Advantage
Hangzhou Nanyuan Organic Silicone Technology Co. Ltd		sales@nanyuan-chem.com	China	455	58
Shaoxing Yangding Biotechnology Co., LTD			China	19	58
SHANGHAI KEAN TECHNOLOGY CO., LTD.		cooperation@kean-chem.com	China	40068	58
Shanghai Haohong Scientific Co., Ltd.	400-400-8210725	malulu@leyan.com	China	39953	58
Henan Fengda Chemical Co., Ltd	+86-371-86557731	info@fdachem.com	China	20291	58
Shanghai Aladdin Bio-Chem Technology Co.,LTD	400-400-6206333	market@aladdin-e.com	China	25009	65
Shanghai Maclean Biochemical Technology Co., LTD	021-50706066	shenlinxing@macklin.cn	China	29802	58
Zhengzhou Alfa Chemical Co.,Ltd		sale04@alfachem.cn	China	13369	58

2816-43-5(TRIPHENYLGERMANE) Related Search:

GERMANIUM TRIPHENYL TRIPHENYLGERMANIUM HYDRIDE TRIPHENYLGERMANE TRIPHENYL GERMANIUM Triphenylgermanyl hydride Germane, triphenyl- TRIPHENYLGERMANE ISO 9001：2015 REACH 2816-43-5 C18H16Ge C6H53GeH Others Organogermanium Organometallic Reagents Chemical Synthesis CVD and ALD Precursors by Metal Germanium Materials Science Metal Hydrides Micro/NanoElectronics Organometallic Reagents Synthetic Reagents Vapor Deposition Precursors GermaniumSynthetic Reagents Metal HydridesOrganometallic Reagents Organogermanium Others Precursors by Metal Reduction Vapor Deposition Precursors