Hexamethyldisilazane manufacturers and suppliers

Hexamethyldisilazane suppliers

Properties

Melting point:: -78 °C

Boiling point:: 125 °C (lit.)

Density: 0.774 g/mL at 25 °C(lit.)

vapor density: 4.6 (vs air)

vapor pressure: 20 hPa (20 °C)

refractive index: n20/D 1.407(lit.)

Flash point:: 57.2 °F

storage temp.: Store below +30°C.

solubility: Miscible with acetone, benzene, ethyl ether, heptane and perchloroethylene.

pka: 30(at 25℃)

form: Liquid

Specific Gravity: 0.774

color: Colorless

Odor: Ammonia odour

PH Range: 8.5

explosive limit: 0.8-25.9%(V)

Water Solubility: REACTS

Sensitive: Moisture Sensitive

Hydrolytic Sensitivity: 7: reacts slowly with moisture/water

Merck: 14,4689

BRN: 635752

InChIKey: FFUAGWLWBBFQJT-UHFFFAOYSA-N

LogP: 0.23-1.19 at 20-25℃

CAS DataBase Reference: 999-97-3(CAS DataBase Reference)

NIST Chemistry Reference: Silanamine, 1,1,1-trimethyl-N-(trimethylsilyl)-(999-97-3)

EPA Substance Registry System: Hexamethyldisilazane (999-97-3)

Safety Information

Symbol(GHS): GHS02,GHS06

Signal word: Danger

Hazard statements: H225-H302+H332-H311-H412

Precautionary statements: P210-P273-P280-P301+P312-P303+P361+P353-P304+P340+P312

Hazard Codes: F,C,Xn

Risk Statements: 11-20/21/22-34-52/53

Safety Statements: 16-26-36/37/39-45-61

RIDADR: UN 3286 3/PG 2

WGK Germany: 2

RTECS: JM9230000

F: 21

Autoignition Temperature: 325 °C

Hazard Note: Flammable

TSCA: Yes

HS Code: 2931 90 00

HazardClass: 3

PackingGroup: II

Hazardous Substances Data: 999-97-3(Hazardous Substances Data)

Toxicity: LDLO i.p. in mice: 650 mg/kg (Petrarch Systems Inc. Product Information Sheets)

Use

Hexamethyldisilazane mainly used as methyl silane alkylation (such as amikacin, penicillin, cephalosporins and kinds of penicillin derivatives), hydroxyl protectants of antibiotics. It is used as surface treatment agent of diatomite, white carbon black, titanium and blond additives of photoresist in the semiconductor industry. It is used as treatment agent of tearing strength resistance. It is used as a solvent in organic synthesis and organometallic chemistry. It is used as an adhesion promoter for photoresist in photolithography. it is used for the preparation of trimethylsilyl ethers from hydroxy compounds. It is used as an alternative to critical point drying during sample preparation in electron microscopy. It is added to analyte to get silylated diagnostic products during pyrolysis in gas chromatography- mass spectrometry.

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