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ChemicalBook >> CERIUM (IV) AND DILUTE NITRIC ACID

CERIUM (IV) AND DILUTE NITRIC ACID

CERIUM (IV) AND DILUTE NITRIC ACID price.
  • $46.5 - $498.74
  • Product name: CERIUM (IV) AND DILUTE NITRIC ACID
  • CAS:
  • MF:
  • MW: 0
  • EINECS:
  • MDL Number:MFCD01866052
  • Synonyms:CERIUM (IV) AND DILUTE NITRIC ACID;Cerium(IV) and Dilute Nitric acid, Etchant Solution;Cerium(IV) and Dilute Nitric acid, Etchant Solution Concentrate, Ce(IV) concentration 0.50N;Cerium(IV) and Dilute Nitric acid, Etchant Solution, Ce(IV) concentration 0.25N
3 prices
Selected condition:
Brand
  • Alfa Aesar
  • American Custom Chemicals Corporation
Package
  • 5MG
  • 1L
  • 4L
  • ManufacturerAlfa Aesar
  • Product number042110
  • Product descriptionCerium(IV) and Dilute Nitric acid, Etchant Solution, Ce(IV) concentration 0.25N
  • Packaging1L
  • Price$46.5
  • Updated2023-06-20
  • Buy
  • ManufacturerAlfa Aesar
  • Product number042110
  • Product descriptionCerium(IV) and Dilute Nitric acid, Etchant Solution, Ce(IV) concentration 0.25N
  • Packaging4L
  • Price$122
  • Updated2024-03-01
  • Buy
  • ManufacturerAmerican Custom Chemicals Corporation
  • Product numberING0015455
  • Product descriptionCERIUM (IV) AND DILUTE NITRIC ACID 95.00%
  • Packaging5MG
  • Price$498.74
  • Updated2021-12-16
  • Buy
Manufacturer Product number Product description Packaging Price Updated Buy
Alfa Aesar 042110 Cerium(IV) and Dilute Nitric acid, Etchant Solution, Ce(IV) concentration 0.25N 1L $46.5 2023-06-20 Buy
Alfa Aesar 042110 Cerium(IV) and Dilute Nitric acid, Etchant Solution, Ce(IV) concentration 0.25N 4L $122 2024-03-01 Buy
American Custom Chemicals Corporation ING0015455 CERIUM (IV) AND DILUTE NITRIC ACID 95.00% 5MG $498.74 2021-12-16 Buy

Properties

form :Liquid
Water Solubility :Soluble in water

Safety Information

Symbol(GHS):
Signal word:
Hazard statements:
Code Hazard statements Hazard class Category Signal word Pictogram P-Codes
Precautionary statements:

Description

It is widely applied as etchant solution in industrial purpose to chemically remove layers from the surface of a wafer during manufacturing.

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