Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)|氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 基本信息 更多信息
中文名称:氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
中文同义词:氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95 (METALS BASIS EXCLUDING ZR);氧化铪(IV)溅射靶, 76.2MM (3.0IN) 直径 X 6.35MM (0.25IN) 厚, 99.95 (METALS BASIS 去除 ZR);氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
英文名称:Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)
英文同义词:Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr);Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis
CAS号:
分子式:HfO2
分子量:210.4888
EINECS号:
Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)|氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK,
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