Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6...
| Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr)|氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 基本信息 更多信息 |
中文名称: | 氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, | 中文同义词: | 氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, 99.95 (METALS BASIS EXCLUDING ZR);氧化铪(IV)溅射靶, 76.2MM (3.0IN) 直径 X 6.35MM (0.25IN) 厚, 99.95 (METALS BASIS 去除 ZR);氧化铪溅射靶材 76.2MM (3.0IN) DIA X 6.35MM (0.25IN) THICK, | 英文名称: | Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr) | 英文同义词: | Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr);Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis | CAS号: | | 分子式: | HfO2 | 分子量: | 210.4888 | EINECS号: | | |
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Hafnium(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 99.95 (metals basis excluding Zr) 推荐供应商 |
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