CARBON SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250..
| CARBON SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.999% (METALS BASIS)|碳溅射耙, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99. 基本信息 更多信息 |
中文名称: | 碳溅射耙, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99. | 中文同义词: | 碳溅射耙, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.;碳溅射靶, 50.8MM (2.0IN) 直径 X 6.35MM (0.250IN) 厚, 99.999% (METALS BASIS) | 英文名称: | CARBON SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.999% (METALS BASIS) | 英文同义词: | CARBON SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.999% (METALS BASIS) | CAS号: | | 分子式: | CH4 | 分子量: | 16.04246 | EINECS号: | 231-955-3 | |
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CARBON SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.999% (METALS BASIS) 推荐供应商 |
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