High-quality molybdenumdiselenide few-layerfilms aredirectly grown on substrates (SiO2/Si) via the chemical vapour deposition (CVD) method.
Molybdenum diselenide few-layerfilms show great potential in energy processing and storage devices (such aslithium and sodium ion batteries) due to their large interlayer spacing (0.64 nm) and higher electrical conductivity. It has also been widely used in lasers, capacitors, photodetectors, and photoelectrochemical cells as catalysts for hydrogen evolution reactions (HERs).
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