英文名称中文名称CASMF
INDIUM(III) NITRATE PENTAHYDRATE 99.99% H10InN3O14
indium(3+) tetrafluoroborate(1-) 氟硼酸铟 27765-48-6 B3F12In
indium tetraphenylporphyrin 5,10,15,20-四苯基-21H,23H-卟啉铟(1+) 72451-33-3 C44H28InN4
IndiumChloride[113mIn] 氯化铟[113MIN]
111-indium-ethylenediaminetetracetic acid-biotin
INDIUM ETHYLHEXANO-MONOISOPROPOXIDE C19H41InO3
INDIUM TRIFLUORIDE, ANHYDROUS 99. F3In
INDIUM SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.999% (METALS BASIS) In
INDIUM WIRE, 0.25MM (0.01IN) DIA, PURATRONIC®, 99.998+% (METALS BASIS) In
Indium115 14191-71-0 In
Indium113 Indium113 14885-78-0 In
indium In 113m sulfur colloid
INDIUM DIMETHYLAMIDE C2H6InN
INDIUM DIETHYLAMIDE C12H30InN3
INDIUM HYDROXIDE 氢氧化铟 20661-21-6 H3InO3
INDIUM(III) BROMIDE 溴化铟(III) 13465-09-3 Br3In
indium(3+) neodecanoate 68310-35-0 C30H57InO6
INDIUM MAGNESIUM OXIDE 158346-28-2 H7InMgO
INDIUM(III) ISOPROPOXIDE 异丙醇铟 38218-24-5 C3H11InO
INDIUM STANDARD SOLUTION, 1 MG/ML IN IN 2% HNO3, FOR AAS 铟原子标样 In
Indium111 15750-15-9 In
INDIUM ARSENIDE 砷化铟 1303-11-3 AsIn
INDIUM SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.999% (METALS BASIS) In
INDIUM(III)-BROMID Br3In
INDIUM SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 99.99% (METALS BASIS) 铟溅射靶材, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK, 9 In
Indium nitrate hydrate 硝酸铟 13465-14-0 H6InNO4
INDIUM (II) SULFIDE 4N硫化铟 12030-14-7 H2InS
INDIUM WIRE, 0.5MM (0.02IN) DIA, PURATRONIC®, 99.998+% (METALS BASIS) In
INDIUM WIRE, 0.5MM (0.02IN) DIA, PURATRONIC®, 99.999% (METALS BASIS) In
INDIUM(III) CHLORIDE TETRAHYDRATE 氯化铟(Ⅲ)四水合物 22519-64-8 Cl3H2InO
INDIUM INGOT, 99.999% (METALS BASIS) In
IndiumGalliumEutectic 鎵銦合金
Indium antimony InSb
Indium chloride 10025-82-8 Cl3In
Indium ion(+3) In+3
INDIUM(III) SULFATE HYDRATE 硫酸铟水合物, PURATRONIC|R, 99.999% (METALS BASIS) H2In2O13S3
IndiumIngots(99.99%)
Indium bromide Br3In
Indium chloride 氯化铟 10025-82-8 Cl3In
INDIUM ICP/DCP STANDARD SOLUTION (HNO3) In
INDIUM WIRE, 1.0MM (0.04IN) DIA, PURATRONIC®, 99.999% (METALS BASIS) In
INDIUM(III)SULPHATE,HYDRATE H2In2O13S3
INDIUMDIETHYLENETRIAMINEPENTAACETICACID C42H54In5N9O30
INDIUM WIRE, 1.0MM (0.04IN) DIA, PURATRONIC®, 99.998+% (METALS BASIS) In
INDIUM POWDER, -325 MESH, PURATRONIC®, 99.999% (METALS BASIS) In
INDIUM - 4% HNO3 500ML In
INDIUM(II) CHLORIDE 99.9% 氯化铟(II) 13465-11-7 Cl2In
INDIUM SULFAMATE SOLUTION,10% IN H6InN3O9S3
INDIUM CARBONATE CIn2O3
INDIUM TIN ALKOXIDE H2InO3Sn
INDIUM FLUORIDE, HYDROUS F3H2InO
INDIUM(III) ACETATE HYDRATE 乙酸铟水合物 304671-64-5 C6H11InO7
Indium trichloride-In111 50800-85-6 Cl3In
INDIUM(III)SULPHATE,ANHYDROUS In2O12S3
INDIUM - 10% HCL 500ML In
indium hydroxide oxide 12125-53-0 HInO2
INDIUM(III) SULFIDE 硫化铟 12030-24-9 In2S3
indium DTPA-albumin
indium-pentetreotide
Indium 111In-satumomab pendetide
indium-ethylenedicysteine C24H42In2N6O12S6
INDIUM - 4% HNO3 250ML In
INDIUM SHOT, 1MM (0.04IN), PURATRONIC®, 99.999% (METALS BASIS) In
INDIUM FOIL, 2.0MM (0.08IN) THICK, PURATRONIC®, 99.998% (METALS BASIS) In
INDIUM FOIL, 0.25MM (0.01IN) THICK, 99.99% (METALS BASIS) In
INDIUM, PLASMA STANDARD SOLUTION, SPECPURE®, IN 10,000µG/ML In
INDIUM SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.99% (METALS BASIS) In
INDIUM(III) SULFATE PENTAHYDRATE 17069-79-3 H10In2O17S3
INDIUM FLUORIDE 氟化铟 7783-52-0 F3In
indium aggregated albumin
Indium Standard for AAS 用于 AAS 的铟标准品 In
INDIUM(III) PERCHLORATE HYDRATE 高氯酸铟 314041-16-2 In(ClO4)3xH2O
Indium tin oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick, 10% wt, 99.99% (metals basis) 锡酸铟 溅射靶材 In2O7Sn2
Indium, plasma standard solution, Specpure, In 10,000μg/ml 铟 等离子标准溶液 In
Indium sulfate 硫酸铟 13464-82-9 In2O12S3
INDIUM FLUOBORATE B3F12In
INDIUM N-PROPOXIDE C9H21InO3
INDIUM FLUORIDE TRIHYDRATE 氟化铟(III)三水 14166-78-0 F3H2InO
Indium(III) oxide 氧化铟 1312-43-2 In2O3
INDIUM ICP STANDARD SOLUTION FLUKA FOR In
INDIUM ACETYLACETONATE 2,4-戊二酸铟 14405-45-9 C15H21InO6
Indium: 7N+purity ingot, shapes and shot In
Indium: MBE grade 7N+ purity shaped ingot and shot In
Indium(II)dihydoxide H2InO2
Indium(II) tetrafluoroborate B2F8In
Indium(I) fluoride FIn
Indium triperchlorate octahydrate Cl3H16InO20
Indium(I) tetrafluoroborate BF4In
Indium trichloride 三氯化铟 12672-70-7 ClH4In
INDIUM DICHLORIDE Cl2In
INDIUM 2-ETHYLHEXANOATE 异辛酸铟 C24H45InO6
INDIUM-IRON OXIDE 158346-34-0 FeH5InO
INDIUM PERCHLORATE 八水高氯酸铟 13465-15-1 Cl3H16InO20
INDIUM SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.999% (METALS BASIS) In
INDIUMPLASMAEMISSIONSTANDARD,1ML=10MGIN
indium DTPA-adriamycin
indium 1-(4-isothiocyanatobenzyl)diethylenetriaminepentaacetic acid C66H72In4N12O30S3
INDIUM(III) PHOSPHATE 磷酸铟 14693-82-4 InO4P
INDIUM (II) SELENIDE InSe
INDIUM NITRATE 硝酸铟 13770-61-1 InN3O9
16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 98 99 100 101 102 103 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 123 124 125 126 127 128 129 130 131 132 133 134 135 136 137 138 139 140 141 142 143 144 145 146 147 148 149 150 151 152 153 154 155 156 157 158 159 160 161 162 163 164 165 166 167 168 169 170 171 172 173 174 175 176