Polmet
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氧化铝型抛光粉Polmet
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LGC-300
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实验室玻璃清洗剂LGC-300
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Buffer HF Improved
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加HF改进的缓冲剂
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53744-42-6
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Al ETCH TYPE A D
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铝蚀刻剂A 铝蚀刻剂D
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Palladium ETCH TFP
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钯蚀刻剂和铂蚀刻剂
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TRANSETCH — N
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氮化硅、氮化镓或氧化铝膜的选择性蚀刻剂TRANSETCH — N
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TRANSENE Ultrasonic Detergent TUD
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Transene 超声洗涤剂TUD
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Silver etchant TFS
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银蚀刻剂TFS
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TANTALUM NITRIDE ETCHANT SIE8607
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钽蚀刻剂SIE—8607和111
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BUFFERED OXIDE ETCHANTS (BOE)
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BUFFERED OXIDE ETCHANTS (BOE)10:1 15:1 100:1
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CHROMIUM ETCHANT
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铬蚀刻剂1020,1020AC
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TITANIUM ETCHANTS
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钛蚀刻剂TFT,TFTN
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Silox Vapox III
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二氧化硅(SiO2)蚀刻剂Silox Vapox III
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NICKEL ETCHANT
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镍蚀刻剂TFB,TFG,I型
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TRANSENE-100
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Transene 100 清洗剂
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GOLD ETCHANT
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金蚀刻剂8148,TFA,8110,8111
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ITO etchant TE-100
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氧化锡/铟锡蚀刻剂TE100
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MOLY ETCHANT TFM
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TFM钼蚀刻和TFW钨蚀刻剂
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COPPER ETCHANTS
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铜蚀刻剂CE-100,CE-200,APS-100,49-1,BTP
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NICHROME ETCHANTS
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镍铬蚀刻剂TFC和TFN
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TI-TUNGSTEN ETCHANT TiW-30
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钛—钨蚀刻剂TiW—30
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Etchants
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半导体蚀刻剂
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Gallium Phophide ETCH
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磷化镓蚀刻剂GaP
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