|
Polmet
|
氧化铝型抛光粉Polmet
|
|
|
LGC-300
|
实验室玻璃清洗剂LGC-300
|
|
|
Buffer HF Improved
|
加HF改进的缓冲剂
|
53744-42-6
|
|
Al ETCH TYPE A D
|
铝蚀刻剂A 铝蚀刻剂D
|
|
|
Palladium ETCH TFP
|
钯蚀刻剂和铂蚀刻剂
|
|
|
TRANSETCH — N
|
氮化硅、氮化镓或氧化铝膜的选择性蚀刻剂TRANSETCH — N
|
|
|
TRANSENE Ultrasonic Detergent TUD
|
Transene 超声洗涤剂TUD
|
|
|
Silver etchant TFS
|
银蚀刻剂TFS
|
|
|
TANTALUM NITRIDE ETCHANT SIE8607
|
钽蚀刻剂SIE—8607和111
|
|
|
BUFFERED OXIDE ETCHANTS (BOE)
|
BUFFERED OXIDE ETCHANTS (BOE)10:1 15:1 100:1
|
|
|
CHROMIUM ETCHANT
|
铬蚀刻剂1020,1020AC
|
|
|
TITANIUM ETCHANTS
|
钛蚀刻剂TFT，TFTN
|
|
|
Silox Vapox III
|
二氧化硅（SiO2）蚀刻剂Silox Vapox III
|
|
|
NICKEL ETCHANT
|
镍蚀刻剂TFB，TFG，I型
|
|
|
TRANSENE-100
|
Transene 100 清洗剂
|
|
|
GOLD ETCHANT
|
金蚀刻剂8148，TFA，8110,8111
|
|
|
ITO etchant TE-100
|
氧化锡/铟锡蚀刻剂TE100
|
|
|
MOLY ETCHANT TFM
|
TFM钼蚀刻和TFW钨蚀刻剂
|
|
|
COPPER ETCHANTS
|
铜蚀刻剂CE-100，CE-200，APS-100，49-1，BTP
|
|
|
NICHROME ETCHANTS
|
镍铬蚀刻剂TFC和TFN
|
|
|
TI-TUNGSTEN ETCHANT TiW-30
|
钛—钨蚀刻剂TiW—30
|
|
|
Etchants
|
半导体蚀刻剂
|
|
|
Gallium Phophide ETCH
|
磷化镓蚀刻剂GaP
|
|