Tris(trimethyL;TRIMETHYLSILYL PHOSPHENE;Tri(trimethylsilyl)phosphine;TRIS(TRIMETHYLSILYL)PHOSPHINE;Tris(trimethylsilyl)phosphane;Phosphine,tris(trimethylsilyl)-;[Tris(trimethylsilyl)]phosphine,98%;Tris(trimethylsilyl)phosphine,min.98%;[Ttris(trimethylsilyl)]phosphine, 98%;Tris(trimethylsilyl)phosphine, min. 98%
물질구분: 유독물질; 혼합물(제품)함량정보: 트리스(트리메틸실릴)포스핀 및 이를 1% 이상 함유한 혼합물
그림문자(GHS):
신호 어:
Danger
유해·위험 문구:
암호
유해·위험 문구
위험 등급
범주
신호 어
그림 문자
P- 코드
H250
공기에 노출되면 스스로 발화함
자연발화성 액체;자연발화성 고체
구분 1
위험
P210, P222, P280, P302+P334,P370+P378, P422
H261
물과 접촉시 인화성가스를 발생시킴
물반응성 물질 및 혼합물
구분 2 구분 3
위험 경고
P231+P232, P280, P370+P378,P402+P404, P501
H315
피부에 자극을 일으킴
피부부식성 또는 자극성물질
구분 2
경고
P264, P280, P302+P352, P321,P332+P313, P362
H319
눈에 심한 자극을 일으킴
심한 눈 손상 또는 자극성 물질
구분 2A
경고
P264, P280, P305+P351+P338,P337+P313P
H335
호흡 자극성을 일으킬 수 있음
특정 표적장기 독성 - 1회 노출;호흡기계 자극
구분 3
경고
예방조치문구:
P210
열·스파크·화염·고열로부터 멀리하시오 - 금연 하시오.
P231+P232
불활성 기체 하에서 취급하고, 습기를 방지하시오.
P280
보호장갑/보호의/보안경/안면보호구를 착용하시오.
P302+P334
피부에 묻은 경우,냉수에 담그기/젖은 붕대로 감싸기
P370+P378
화재 시 불을 끄기 위해 (Section 5. 폭발, 화재시 대처방법의 적절한 소화제)을(를) 사용하시오.
P422
적절한 물질을(를) 충진하여 보관하시오.
NFPA 704
2
3
0
트리페닐메틸륨 테트라키스(펜타플루오로페닐)보레 이트(1-) C화학적 특성, 용도, 생산
화학적 성질
Colorless to light yellow liqui
물리적 성질
mp 24 °C; bp 243–244 °C; d 0.863 g cm?3; n20
D
1.501–1.503.
용도
Tris(trimethylsilyl)phosphine is a more stable analog of phosphine, but retains high reactivity due to the presence of the weak polar Si–P bond. It is nucleophilic and readily reacts with a range of electrophiles. Reaction with alkylating agents provides substituted phosphines, with acid chlorides phosphaalkenes can be obtained, and phosphabenzenes can be synthesized upon reaction with pyrylium salts.
It can be used as user-friendly phosphorus source and alternative to phosphine
gas, precursor of (Me3Si)2PLi, covalent synthon for the
anion P3?).
제조 방법
several preparative methods are known.
These include the following: reaction of alkali metal phosphides
(NaPH2, KPH2, Li3P, usually prepared by reaction
of metal and phosphine gas or via metal alkyl derivative) with
chlorotrimethylsilane or fluorotrimethylsilane in 1,2-dimethoxyethane
or diethyl ether; reaction of sodium–potassium
alloy with white or red phosphorus in refluxing 1,2-
dimethoxyethane for 24 h followed by addition of
chlorotrimethylsilane and heating at reflux for 72 h (good
stirring is necessary for high yield of product), evaporation of
the solvent, and vacuum distillation (75% yield); reaction
of piperidinodichlorophosphine with lithium powder and
chlorotrimethylsilane in refluxing tetrahydrofuran (71%
yield); reaction of phosphine with excess of trimethylsilyl
triflate in the presence of a tertiary amine in an inert solvent
(Et2O) at low temperature (90% yield); reaction of phosphorus
trichloride, magnesium, and chlorotrimethylsilane (62%
yield). The last method is considered to be the most cost
effective and also the safest approach.
Synthesis
Tris(trimethylsilyl)phosphine is prepared by treating trimethylsilyl chloride, white phosphorus, and sodium-potassium alloy:
1/4 P4 + 3 Me3SiCl+ 3 K → P(SiMe3)3 + 3 KCl
