- 1,1,3,3-Tetramethyldisilazane
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- $5.00 / 1KG
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2024-03-27
- CAS:15933-59-2
- Min. Order: 1KG
- Purity: 98%
- Supply Ability: g-kg-tons, free sample is available
- Tetramethyldisilazane
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- $5.00 / 1KG
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2023-03-06
- CAS:15933-59-2
- Min. Order: 1KG
- Purity: 99%
- Supply Ability: 10000kg
- Tetramethyldisilazane
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- $7.98/ L
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2022-11-12
- CAS:15933-59-2
- Min. Order: 25L
- Purity: 92%
- Supply Ability: 18000 L per year
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| | 1,1,3,3-Tetramethyldisilazane Basic information |
| Product Name: | 1,1,3,3-Tetramethyldisilazane | | Synonyms: | Silanamine, N-(dimethylsilyl)-1,1-dimethyl-;1,1,3,3-TETRAMETHYLDISILAZANE;N-(dimethylsilyl)-1,1-dimethylsilylamine;TETRAMETHYLDISILAZANE 98+%;1,1,3,3-Tetramethyl-2-azatrisilane;Disilazane, 1,1,3,3-tetramethyl-;N-(Dimethylsilyl)(dimethyl)silanamine;n-(dimethylsilyl)-1,1-dimethyl-silanamin | | CAS: | 15933-59-2 | | MF: | C4H15NSi2 | | MW: | 133.34 | | EINECS: | 240-072-2 | | Product Categories: | Chemical Synthesis;Organometallic Reagents;Organosilicon;Analytical Chemistry;Dimethylsilylation (GC Derivatizing Reagents);GC Derivatizing Reagents;Si (Classes of Silicon Compounds);Si-H Compounds;Silazanes;Silylation (GC Derivatizing Reagents);Si-N Compounds | | Mol File: | 15933-59-2.mol |  |
| | 1,1,3,3-Tetramethyldisilazane Chemical Properties |
| Melting point | 99-100 °C | | Boiling point | 99-100 °C | | density | 0.752 g/mL at 25 °C(lit.) | | refractive index | n20/D 1.404(lit.) | | Fp | 17 °F | | storage temp. | Store below +30°C. | | solubility | Miscible with common organic solvents. | | pka | 9.80±0.70(Predicted) | | form | clear liquid | | color | Colorless to Almost colorless | | Specific Gravity | 0.752 | | Sensitive | Moisture Sensitive | | Hydrolytic Sensitivity | 7: reacts slowly with moisture/water | | BRN | 741869 | | CAS DataBase Reference | 15933-59-2(CAS DataBase Reference) | | EPA Substance Registry System | Silanamine, N-(dimethylsilyl)-1,1-dimethyl- (15933-59-2) |
| Hazard Codes | F,Xi | | Risk Statements | 11-36/37/38 | | Safety Statements | 16-26-36 | | RIDADR | UN 2924 3/PG 2 | | WGK Germany | 3 | | F | 10-21 | | TSCA | Yes | | HazardClass | 3 | | PackingGroup | II | | HS Code | 29319090 |
| | 1,1,3,3-Tetramethyldisilazane Usage And Synthesis |
| Chemical Properties | Clear colorless to faintly yellow liquid | | Physical properties | bp 99–100 °C; n20
D 1.4040; d 0.752 g cm?3. | | Uses | Tetramethyldisilazane is used as a gas chromatographic derivatizing reagent. Further, it reacts with phenol to prepare dimethylphenoxysilane. In addition, it is used in electronic, polymer and pharmaceutical industries. | | Uses | 1,1,3,3-Tetramethyldisilazane is widely used in intramolecular hydrosilation of allyl alcohols, homoallyl
alcohols, and homopropargyl alcohols for the regio- and
stereoselective synthesis of polyols | | Properties and Applications | The ICP CVD synthesis of SiCxNy: H thin films using 1,1,3,3-tetramethyldisilazane (TMDSZ ) as a single-source precursor and argon as a gas-activator[1]. Using TMDSZ as the single-source compound produced amorphous hydrogenated silicon carbonitride (a-SiCN: H) films, whereas no such films were formed when HMDSZ was used, which was attributed to the lack of Si–H bond in HMDSZ. Under the collision-free condition, the formation of ?CH3, NH3, and DMSA was demonstrated from the decomposition of TMDSZ on the heated W filament. Free-radical short-chain reactions dominate the secondary gas-phase reactions of TMDSZ in the reactor setup. The short-chain reaction is initiated by the formation of methyl radicals via the cleavage of the Si–CH3 bonds of TMDSZ. The H abstraction by the produced methyl radicals from the Si–H or the C–H bond in various stable molecules (e.g., TMDSZ) propagates the chain with a resulting radical, which recombines with another radical to terminate the chain reactions, producing a series of products in the high-mass region[2]. | | References | [1] Maksim N. Chagin. “Synthesis, Properties and Aging of ICP-CVD SiCxNy:H Films Formed from Tetramethyldisilazane.” Coatings (2022).
[2] James Michael Stevenson, Eric Ampong and Yujun Shi*. “Understanding the Reaction Chemistry of 1,1,3,3-Tetramethyldisilazane as a Precursor Gas in a Catalytic Chemical Vapor Deposition Process.” The Journal of Physical Chemistry A 127 44 (2023): 9185–9195. |
| | 1,1,3,3-Tetramethyldisilazane Preparation Products And Raw materials |
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