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ChemicalBook >제품 카탈로그 >TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)

TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)

TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS) 구조식 이미지
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상품명:
TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)
동의어(영문):
TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS)
CBNumber:
CB5660188
분자식:
O5Ta2
포뮬러 무게:
441.8928
MOL 파일:
Mol file

TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS) 속성

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TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS) C화학적 특성, 용도, 생산

TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS) 준비 용품 및 원자재

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TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.9% (METALS BASIS) 공급 업체

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