Hafnium silicide:Crystal structure,Characteristics,Uses

Hafnium silicide is a kind of transition metal silicide with gray black appearance. The chemical formula is HfSi2. The melting point is 1680°C. The density was 8.02 g / cm3. Hafnium silicide is insoluble in water. Hafnium silicide is mainly used in semiconductor components, thin film coating, block structure components, electric heating components, thermoelectric materials, and photovoltaic materials.

Crystal structure

Hafnium silicide has an orthorhombic structure.

Characteristics

Hafnium silicide power has a high melting point, high corrosion resistance, high oxidation resistance, good electrical conductivity, high-temperature ductility, a binary alloy system in the intermediate phase, and dual characteristics of metals and ceramics.

Uses

Hafnium Silicide (HfSi2) is a transition metal silicide, a type of refractory intermetallic compound. Because of its unique physical and chemical properties, it is used in cermets, high-temperature oxidation-resistant coatings, high-temperature structural materials, and aviation, aerospace, and other fields.

To inhibit oxidation, enhance the erosion resistance of the matrix, and make up for the defects after ablation, HfSi2 can be used as a Hf source for in-situ synthesis of HfC.