Chinese english Japanese Germany Korea
ChemicalBook > Product Catalog >Organic Chemistry >Organometallic compounds >Rare-Earth Metal >TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV)

TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV)

TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) Structure
CAS No.
19782-68-4
Chemical Name:
TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV)
Synonyms
TDMAH;amido)hafnium(IV);TDMAH: Hf(N(CH3)2)4;0.2% Zr) TDMAH, PURATREM;Hafnium(4+) dimethylamide;Hafnium tetradimethylamide;Dimethylamine hafnium(4+) salt;TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV);Tetrakis(dimethylamino)hafnium(TDMAHf);(19962-11-9) hafnium tetradimethylamide
CBNumber:
CB0501512
Molecular Formula:
C8H24HfN4
Molecular Weight:
354.79
MOL File:
19782-68-4.mol
MSDS File:
SDS
Modify Date:
2023/4/23 13:52:06
Request For Quotation

TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) Properties

Melting point 26-29 °C(lit.)
Boiling point 85°C/0.1mm
Density 1.098 g/mL at 25 °C
Flash point 109 °F
form crystal
color colorless to pale yellow
Specific Gravity 1.40
Hydrolytic Sensitivity 8: reacts rapidly with moisture, water, protic solvents
Sensitive moisture sensitive, store cold
InChIKey ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
CAS DataBase Reference 19782-68-4

SAFETY

Risk and Safety Statements

Symbol(GHS) 
GHS02,GHS05
Signal word  Danger
Hazard statements  H228-H261-H314
Precautionary statements  P210-P231+P232-P280-P305+P351+P338-P370+P378-P402+P404
Hazard Codes  F,C
Risk Statements  11-14-34
Safety Statements  6-26-36/37/39-43-45
RIDADR  UN 3396 4.3/PG 2
WGK Germany  3

TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) price More Price(2)

Manufacturer Product number Product description CAS number Packaging Price Updated Buy
Sigma-Aldrich(India) 666610 Tetrakis(dimethylamido)hafnium(IV) packaged for use in deposition systems 19782-68-4 25G ₹175397.48 2022-06-14 Buy
Sigma-Aldrich(India) 455199 Tetrakis(dimethylamido)hafnium(IV) ≥99.99% 19782-68-4 25G ₹79920.98 2022-06-14 Buy
Product number Packaging Price Buy
666610 25G ₹175397.48 Buy
455199 25G ₹79920.98 Buy

TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) Chemical Properties,Uses,Production

Uses

Used as precursor for atomic layer deposition of Hafnium Oxide nanolaminates, which are used as a reploacement for Silicon oxide in semiconductor devices.

General Description

Please inquire for bulk quantity, pricing, and packaging options.

TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) Preparation Products And Raw materials

Raw materials

Preparation Products

TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) Suppliers

Global( 50)Suppliers
Supplier Tel Country ProdList Advantage Inquiry
CONIER CHEM AND PHARMA LIMITED +8618523575427 China 49391 58 Inquiry
career henan chemical co +86-0371-86658258 +8613203830695 China 29826 58 Inquiry
Fuxin Pharmaceutical +86-021-021-50872116 +8613122107989 China 10297 58 Inquiry
SHANGHAI T&W PHARMACEUTICAL CO., LTD. +86-021-61551413 +8618813727289 China 5738 58 Inquiry
Hefei TNJ Chemical Industry Co.,Ltd. 0551-65418671 China 34571 58 Inquiry
Shanghai UCHEM Inc. +862156762820 +86-13564624040 China 7034 58 Inquiry
Shaanxi Dideu Medichem Co. Ltd +86-029-89586680 +86-18192503167 China 9030 58 Inquiry
SUZHOU SENFEIDA CHEMICAL CO.,LTD +86-0512-83500002 +8615195660023 China 23053 58 Inquiry
LEAPCHEM CO., LTD. +86-852-30606658 China 43348 58 Inquiry
Xiamen Work-For-World Medicine Co.,Ltd. +undefined15921822462 China 235 58 Inquiry
Supplier Advantage
CONIER CHEM AND PHARMA LIMITED 58
career henan chemical co 58
Fuxin Pharmaceutical 58
SHANGHAI T&W PHARMACEUTICAL CO., LTD. 58
Hefei TNJ Chemical Industry Co.,Ltd. 58
Shanghai UCHEM Inc. 58
Shaanxi Dideu Medichem Co. Ltd 58
SUZHOU SENFEIDA CHEMICAL CO.,LTD 58
LEAPCHEM CO., LTD. 58
Xiamen Work-For-World Medicine Co.,Ltd. 58

19782-68-4(TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV))Related Search:

(PMe3)4Ru(Cl)(OAc) TETRAKIS(ACETONITRILE)SILVER(I) TETRAFLUOROBORATE Trityl tetrakis(pentafluorophenyl)borate Tetrakis(triphenylphosphine)nickel TETRAKIS(DIMETHYLAMINO)ZIRCONIUM
Germanium dimethylamide Vanadium tetrakis(dimethylamide) TETRAKIS(DIMETHYLAMINO)TITANIUM TETRAKIS(DIMETHYLAMINO)TIN TETRAKIS(ETHYLMETHYLAMINO)HAFNIUM
TETRAKIS(DIETHYLAMINO)TITANIUM Tetrakis(ethylmethylamino)vanadium(IV) TETRAKIS(DIETHYLAMINO)HAFNIUM Tetrakis(triphenylphosphine)palladium TETRAKIS(DIETHYLAMINO)ZIRCONIUM
TETRAKIS(ETHYLMETHYLAMINO)ZIRCONIUM
chevron_left

1of4

chevron_right
Tetrakis(dimethylamido)hafnium(IV),TDMAH, Tetrakis(dimethylamino)hafnium(IV) TDMAH Tetrakis(dimethylamino)hafnium(IV) 99.999% Dimethylamine hafnium(4+) salt Hafnium tetradimethylamide Hafnium(4+) dimethylamide TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV), 99.99+% Tetrakis(dimethylamido)hafnium(IV) packaged for use in deposition systems Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV) (19962-11-9) hafnium tetradimethylamide Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50 ml Swagelok(R) cylinder (96-1070) for CVD/ALD Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2%-Zr) TDMAH, PURATREM, 72-8000, contained in 50ml Swagelok(R) cylinder (96-1071) for CVD/ALD TDMAH: Hf(N(CH3)2)4 0.2% Zr) TDMAH, PURATREM Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, < amido)hafnium(IV) TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV), ISO 9001：2015 REACH Tetrakis(dimethylamino)hafnium(TDMAHf) Tetrakis(dimethylamido)hafnium(IV) TDMAH 19782-68-4 4C2H7NHf CH32N4Hf C8H28HfN4 C16H48Hf2N8 ALD Precursors