TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV)
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- ₹79920.98 - ₹175397.48
- Product name: TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV)
- CAS: 19782-68-4
- MF: C8H24HfN4
- MW: 354.79
- EINECS:
- MDL Number:MFCD01862473
- Synonyms:Tetrakis(dimethylamido)hafnium(IV),TDMAH, Tetrakis(dimethylamino)hafnium(IV);TDMAH;Tetrakis(dimethylamino)hafnium(IV) 99.999%;Dimethylamine hafnium(4+) salt;Hafnium tetradimethylamide;Hafnium(4+) dimethylamide;TETRAKIS(DIMETHYLAMIDO)HAFNIUM(IV), 99.99+%;Tetrakis(dimethylamido)hafnium(IV) packaged for use in deposition systems
2 prices
Selected condition:
Brand
- Sigma-Aldrich(India)
Package
- 25G
- ManufacturerSigma-Aldrich(India)
- Product number455199
- Product descriptionTetrakis(dimethylamido)hafnium(IV) ≥99.99%
- Packaging25G
- Price₹79920.98
- Updated2022-06-14
- Buy
- ManufacturerSigma-Aldrich(India)
- Product number666610
- Product descriptionTetrakis(dimethylamido)hafnium(IV) packaged for use in deposition systems
- Packaging25G
- Price₹175397.48
- Updated2022-06-14
- Buy
Manufacturer | Product number | Product description | Packaging | Price | Updated | Buy |
---|---|---|---|---|---|---|
Sigma-Aldrich(India) | 455199 | Tetrakis(dimethylamido)hafnium(IV) ≥99.99% | 25G | ₹79920.98 | 2022-06-14 | Buy |
Sigma-Aldrich(India) | 666610 | Tetrakis(dimethylamido)hafnium(IV) packaged for use in deposition systems | 25G | ₹175397.48 | 2022-06-14 | Buy |
Properties
Melting point :26-29 °C(lit.)
Boiling point :85°C/0.1mm
Density :1.098 g/mL at 25 °C
Flash point :109 °F
form :crystal
color :colorless to pale yellow
Specific Gravity :1.40
Hydrolytic Sensitivity :8: reacts rapidly with moisture, water, protic solvents
Sensitive :moisture sensitive, store cold
InChIKey :ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
CAS DataBase Reference :19782-68-4
Boiling point :85°C/0.1mm
Density :1.098 g/mL at 25 °C
Flash point :109 °F
form :crystal
color :colorless to pale yellow
Specific Gravity :1.40
Hydrolytic Sensitivity :8: reacts rapidly with moisture, water, protic solvents
Sensitive :moisture sensitive, store cold
InChIKey :ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
CAS DataBase Reference :19782-68-4
Safety Information
Symbol(GHS): |
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Description
Used as precursor for atomic layer deposition of Hafnium Oxide nanolaminates, which are used as a reploacement for Silicon oxide in semiconductor devices.Related product price
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