TETRAKIS(DIETHYLAMINO)TITANIUM
- ₹17210 - ₹106160.78
- Product name: TETRAKIS(DIETHYLAMINO)TITANIUM
- CAS: 4419-47-0
- MF: C16H40N4Ti
- MW: 336.38
- EINECS:
- MDL Number:MFCD00015648
- Synonyms:TDEAT;TETRAKIS (DIETHYLAMIDO) TITANIUM;TETRAKIS(DIETHYLAMINO)TITANIUM;TETRAKIS DIETHYL AMINO TITANIUM (IV);TITANIUM (IV) DIETHYLAMIDE;TITANIUM TETRAKIS(DIETHYLAMIDE);Titanium, tetrakis(diethylamino)-;TETRAKIS(DIETHYLAMINO)TITANIUM, 99.999%
6 prices
Selected condition:
Brand
- Sigma-Aldrich(India)
- ALFA India
Package
- 5G
- 5ML
- 10G
- 25G
- ManufacturerSigma-Aldrich(India)
- Product number725536
- Product descriptionTetrakis(diethylamido)titanium(IV) packaged for use in deposition systems
- Packaging10G
- Price₹106160.78
- Updated2022-06-14
- Buy
- ManufacturerSigma-Aldrich(India)
- Product number8.14018
- Product descriptionTetrakis(diethylamino)titanium for synthesis
- Packaging5ML
- Price₹37770
- Updated2022-06-14
- Buy
- ManufacturerSigma-Aldrich(India)
- Product number469866
- Product descriptionTetrakis(diethylamido)titanium(IV) 99.999% trace metals basis
- Packaging25G
- Price₹30667.23
- Updated2022-06-14
- Buy
- ManufacturerSigma-Aldrich(India)
- Product number469866
- Product descriptionTetrakis(diethylamido)titanium(IV) 99.999% trace metals basis
- Packaging5G
- Price₹25655.25
- Updated2022-06-14
- Buy
- ManufacturerSigma-Aldrich(India)
- Product number407399
- Product descriptionTetrakis(diethylamido)titanium(IV) technical grade
- Packaging5G
- Price₹17210
- Updated2022-06-14
- Buy
- ManufacturerALFA India
- Product numberALF-040469-09
- Product descriptionTetrakis(diethylamino)titanium(IV), 99.99% (metals basis)
- Packaging10g
- Price₹24412
- Updated2022-05-26
- Buy
Manufacturer | Product number | Product description | Packaging | Price | Updated | Buy |
---|---|---|---|---|---|---|
Sigma-Aldrich(India) | 725536 | Tetrakis(diethylamido)titanium(IV) packaged for use in deposition systems | 10G | ₹106160.78 | 2022-06-14 | Buy |
Sigma-Aldrich(India) | 8.14018 | Tetrakis(diethylamino)titanium for synthesis | 5ML | ₹37770 | 2022-06-14 | Buy |
Sigma-Aldrich(India) | 469866 | Tetrakis(diethylamido)titanium(IV) 99.999% trace metals basis | 25G | ₹30667.23 | 2022-06-14 | Buy |
Sigma-Aldrich(India) | 469866 | Tetrakis(diethylamido)titanium(IV) 99.999% trace metals basis | 5G | ₹25655.25 | 2022-06-14 | Buy |
Sigma-Aldrich(India) | 407399 | Tetrakis(diethylamido)titanium(IV) technical grade | 5G | ₹17210 | 2022-06-14 | Buy |
ALFA India | ALF-040469-09 | Tetrakis(diethylamino)titanium(IV), 99.99% (metals basis) | 10g | ₹24412 | 2022-05-26 | Buy |
Properties
Melting point :4 °C
Boiling point :112 °C0.1 mm Hg(lit.)
Density :0.931 g/mL at 25 °C(lit.)
refractive index :n20/D 1.536(lit.)
Flash point :-18 °F
storage temp. :Store at +2°C to +8°C.
solubility :Reacts with air.
form :liquid
Specific Gravity :0.95
color :yellow to orange
Hydrolytic Sensitivity :8: reacts rapidly with moisture, water, protic solvents
Sensitive :Moisture Sensitive
BRN :3621431
CAS DataBase Reference :4419-47-0(CAS DataBase Reference)
NIST Chemistry Reference :Tetrakis(diethylamino)titanium(4419-47-0)
EPA Substance Registry System :Ethanamine, N-ethyl-, titanium(4+) salt (4419-47-0)
Boiling point :112 °C0.1 mm Hg(lit.)
Density :0.931 g/mL at 25 °C(lit.)
refractive index :n
Flash point :-18 °F
storage temp. :Store at +2°C to +8°C.
solubility :Reacts with air.
form :liquid
Specific Gravity :0.95
color :yellow to orange
Hydrolytic Sensitivity :8: reacts rapidly with moisture, water, protic solvents
Sensitive :Moisture Sensitive
BRN :3621431
CAS DataBase Reference :4419-47-0(CAS DataBase Reference)
NIST Chemistry Reference :Tetrakis(diethylamino)titanium(4419-47-0)
EPA Substance Registry System :Ethanamine, N-ethyl-, titanium(4+) salt (4419-47-0)
Safety Information
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Description
Used as nitride precursor - MOCVD. Precursor to Titanium nitride (TiN) thin films, chemical vapor deposition (CVD). A novel templated non-hydrolytic sol-gel synthesis of titanosilicate xerogels is reported. Acetamide elimination from silicon acetate and titanium diethylamide allows obtaining titanosilicates with a high content of Si-O-Ti bonds but low surface areas. Metal-organic chemical vapor deposition (MOCVD) of TiN thin films at low temperatures and low pressures using tetrakis(diethylamino) Ti (TDEAT) and NH3 is described. TDEAT dissociatively chemisorbs on SiO2 at room temperature or above, resulting in Ti?N bond scission, and Ti?O bond formation.Related product price
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