Buffered oxide etchant (BOE) 6:1 with surfactant 속성
물리적 상태
liquid
안전
Buffered oxide etchant (BOE) 6:1 with surfactant C화학적 특성, 용도, 생산
용도
Buffered oxide etchant (BOE) 6:1 with surfactant may be used in the oxide removal of AlGaN/GaN-based high electron mobility transistors for gate photolithography. It may also be used in a buffer oxide etchant method for the fabrication of micro biochip.
일반 설명
Buffered oxide etchant (BOE) is a wet etchant used in microfabrication. Its primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). It is a mixture of a buffering agent, such as ammonium fluoride (NH4F), and hydrofluoric acid (HF). Concentrated HF etches silicon dioxide too quickly for good process control and also peels photoresist used in lithographic patterning.
Buffered oxide etchant (BOE) 6:1 with surfactant 준비 용품 및 원자재
원자재
준비 용품
Buffered oxide etchant (BOE) 6:1 with surfactant 공급 업체
