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TRIS(DIMETHYLAMINO)SILANE

TRIS(DIMETHYLAMINO)SILANE Structure
CAS No.
15112-89-7
Chemical Name:
TRIS(DIMETHYLAMINO)SILANE
Synonyms
TDMAS;3DMAS;DK087;LS 1460;amino)siL;(Me2N)3SiH;3DMAS : [(CH3)2N]3SiH;Tris(dimethyamino)silane;Tri(dimethylamino)silane;TRIS(DIMETHYLAMINO)SILANE
CBNumber:
CB1241150
Molecular Formula:
C6H19N3Si
Molecular Weight:
161.32
MOL File:
15112-89-7.mol
MSDS File:
SDS
Modify Date:
2024/7/15 16:45:23

TRIS(DIMETHYLAMINO)SILANE Properties

Melting point <0°C
Boiling point 145 °C
Density 0,838 g/cm3
refractive index 1.4247
Flash point 25°C
pka 10.93±0.70(Predicted)
form liquid
color colorless to light yellow
Specific Gravity 0.84
Sensitive air sensitive, moisture sensitive
Hydrolytic Sensitivity 8: reacts rapidly with moisture, water, protic solvents
EPA Substance Registry System N,N,N',N',N'',N''-Hexamethylsilanetriamine (15112-89-7)

SAFETY

Risk and Safety Statements

Symbol(GHS) 
GHS02,GHS05,GHS06
Signal word  Danger
Hazard statements  H225-H261-H302-H311-H314-H330
Precautionary statements  P210-P231+P232-P280-P303+P361+P353-P304+P340+P310-P305+P351+P338
Hazard Codes  F,C
Risk Statements  10-36/37/38-52/53-34-29-20-15-11
Safety Statements  16-26-36/37/39-45-43
RIDADR  1993
WGK Germany  3
RTECS  VV5800000
TSCA  Yes
Toxicity rabbit,LD50,skin,477mg/kg (477mg/kg),LIVER: OTHER CHANGESLUNGS, THORAX, OR RESPIRATION: CHRONIC PULMONARY EDEMA,Toxicology and Industrial Health. Vol. 5, Pg. 45, 1989.

TRIS(DIMETHYLAMINO)SILANE price More Price(2)

Manufacturer Product number Product description CAS number Packaging Price Updated Buy
Sigma-Aldrich(India) 759562 Tris(dimethylamino)silane packaged for use in deposition systems 15112-89-7 25G ₹68803.7 2022-06-14 Buy
Sigma-Aldrich(India) 570133 Tris(dimethylamino)silane electronic grade, 99.999% 15112-89-7 25G ₹14797.78 2022-06-14 Buy
Product number Packaging Price Buy
759562 25G ₹68803.7 Buy
570133 25G ₹14797.78 Buy

TRIS(DIMETHYLAMINO)SILANE Chemical Properties,Uses,Production

Uses

Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.

General Description

Please inquire for quantity, pricing, and packaging options.

TRIS(DIMETHYLAMINO)SILANE Preparation Products And Raw materials

Raw materials

Preparation Products

Global( 89)Suppliers
Supplier Tel Country ProdList Advantage Inquiry
Shanghai Daken Advanced Materials Co.,Ltd +86-371-66670886 China 16220 58 Inquiry
ATK CHEMICAL COMPANY LIMITED +undefined-21-51877795 China 32760 60 Inquiry
career henan chemical co +86-0371-86658258 +8613203830695 China 29826 58 Inquiry
Fuxin Pharmaceutical +86-021-021-50872116 +8613122107989 China 10297 58 Inquiry
Hefei TNJ Chemical Industry Co.,Ltd. 0551-65418671 China 34571 58 Inquiry
WinWin Chemical CO., Limited +86-0577-64498589 +8615325081899 China 14198 58 Inquiry
Dideu Industries Group Limited +86-29-89586680 +86-15129568250 China 26216 58 Inquiry
Dayang Chem (Hangzhou) Co.,Ltd. 571-88938639 +8617705817739 China 52861 58 Inquiry
PT CHEM GROUP LIMITED +86-85511178 +86-85511178 China 35451 58 Inquiry
ShenZhen Trendseen Biological Technology Co.,Ltd. 13417589054 China 11681 58 Inquiry
TRIS(DIMETHYLAMINO)SILANE n,n,n’,n’,n’’,n’’-hexamethyl-silanetriamin n,n,n’,n’,n’’,n’’-hexamethylsilanetriamine N,N,N’,N’,N’’,N’’-hexamethyl-Silanetriamine TRIS(DIMETHYLAMINO)SILANE 99+% N,N',N''-(Silanetriyl)tris(dimethylamine) N,N',N''-Silanetriyltris(dimethylamine) TRIS(DIMETHYLAMINO)SILANE, 99.9+% Tris(diMethylaMino)silane, 99+%, 14-8750, contained in 50 Ml Swagelok cylinder (96-1070) for CVD/ALD (Me2N)3SiH TDMAS Tris(dimethylamido)silane Tris(dimethylamino)silane electronic grade, 99.999% Tris(dimethylamino)silane packaged for use in deposition systems Tris(dimethyamino)silane N,N,N',N',N'',N''-hexamethyl-Silanetriamine tris(Dimethylamino)silane n,n,n',n',n'',n''-hexamethylsilanetriamine n,n,n',n',n'',n''-hexamethyl-silanetriamin Silanetriamine,N,N,N',N',N'',N''-hexamethyl- Tri(dimethylamino)silane LS 1460 Tris(dimethylamino)silane, 99+% 3DMAS 3DMAS : [(CH3)2N]3SiH Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok(R) cylinder (96-1070) for CVD/ALD Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok cylinder (96-1070) for CVD/ALD 3DMAS Tris(dimethylamino)silane Liquid amino)siL Silanetriamine, N,N,N',N',N'',N''-hexamethyl- Tris(dimethylamino)silane 3DMAS TRIS(DIMETHYLAMINO)SILANE ISO 9001:2015 REACH DK087 15112-89-7 CH32N3SiH C6H19N3Si ALD Precursors organosilicon compounds