헥사메틸디실란

헥사메틸디실란
헥사메틸디실란 구조식 이미지
카스 번호:
1450-14-2
한글명:
헥사메틸디실란
동의어(한글):
헥사메틸다이실레인;헥사메틸다이실란;헥사메틸디실란;헥사메틸다이실란(HEXAMETHYLDISILANE)
상품명:
Hexamethyldisilane
동의어(영문):
HMD;1,1,1,2,2,2-Hexamethyldisilane;DK545;CH7280;CFS-142;(CH3)6Si2;DISILANE M6;Permethyldisilane;HEXAMETHYLDISILANE;hexamethyl-disilan
CBNumber:
CB4476113
분자식:
C6H18Si2
포뮬러 무게:
146.38
MOL 파일:
1450-14-2.mol
MSDS 파일:
SDS

헥사메틸디실란 속성

녹는점
9-12 °C (lit.)
끓는 점
112-114 °C (lit.)
밀도
0.715 g/mL at 25 °C (lit.)
굴절률
n20/D 1.422(lit.)
인화점
29 °F
저장 조건
Store at <= 20°C.
용해도
일반적인 유기 용매에 용해되며 H2O에는 불용성입니다.
물리적 상태
액체
Specific Gravity
0.729
색상
무색의
수용성
물에 불용성. 알코올, 에테르, 아세톤에 용해됩니다.
Hydrolytic Sensitivity
1: no significant reaction with aqueous systems
BRN
1633463
안정성
휘발성 물질
InChIKey
NEXSMEBSBIABKL-UHFFFAOYSA-N
CAS 데이터베이스
1450-14-2(CAS DataBase Reference)
NIST
Disilane, hexamethyl-(1450-14-2)
EPA
Disilane, hexamethyl- (1450-14-2)
안전
  • 위험 및 안전 성명
  • 위험 및 사전주의 사항 (GHS)
위험품 표기 F,Xi
위험 카페고리 넘버 11-36/37-43-36/37/38
안전지침서 16-23-45-9-33-26-7/9
유엔번호(UN No.) UN 1993 3/PG 2
WGK 독일 2
RTECS 번호 JM9170000
TSCA Yes
위험 등급 3
포장분류 II
HS 번호 29310095
독성 LD50 orally in Rabbit: 2160 mg/kg LD50 dermal Rabbit 2160 mg/kg
그림문자(GHS): GHS hazard pictogramsGHS hazard pictograms
신호 어: Danger
유해·위험 문구:
암호 유해·위험 문구 위험 등급 범주 신호 어 그림 문자 P- 코드
H225 고인화성 액체 및 증기 인화성 액체 구분 2 위험 GHS hazard pictograms P210,P233, P240, P241, P242, P243,P280, P303+ P361+P353, P370+P378,P403+P235, P501
H317 알레르기성 피부 반응을 일으킬 수 있음 피부 과민성 물질 구분 1 경고 GHS hazard pictograms P261, P272, P280, P302+P352,P333+P313, P321, P363, P501
H319 눈에 심한 자극을 일으킴 심한 눈 손상 또는 자극성 물질 구분 2A 경고 GHS hazard pictograms P264, P280, P305+P351+P338,P337+P313P
H335 호흡 자극성을 일으킬 수 있음 특정 표적장기 독성 - 1회 노출;호흡기계 자극 구분 3 경고 GHS hazard pictograms
예방조치문구:
P210 열·스파크·화염·고열로부터 멀리하시오 - 금연 하시오.
P280 보호장갑/보호의/보안경/안면보호구를 착용하시오.
P302+P352 피부에 묻으면 다량의 물로 씻으시오.
P305+P351+P338 눈에 묻으면 몇 분간 물로 조심해서 씻으시오. 가능하면 콘택트렌즈를 제거하시오. 계속 씻으시오.
NFPA 704
3
2 1

헥사메틸디실란 MSDS


Hexamethyldisilane

헥사메틸디실란 C화학적 특성, 용도, 생산

화학적 성질

Colorless clear liquid

용도

Hexamethyldisilane acts as a silylating reagent for allylic acetates, aryl halides and diketones. It is a source material for vapor deposition during silicon carbide growth. It is also used in electronic and semiconducter industries.

주요 응용

Hexamethyldisilane is an important silane protective agent, which can synthesize sodium trimethylsilane, potassium trimethylsilane and lithium trimethylsilane.
Preparation of iodotrimethylsilane.
Used as trimethylsilane anion reagent.
silylating or reducing reagent in combination with a Pd catalyst or a nucleophile.
Replaces aromatic nitriles with TMS groups in presence of [RhCl(cod)]2.
Precursor for CVD of silicon carbide.
Brings about the homocoupling of arenesulfonyl chlorides in the presence of Pd2(dba)3.
Used as a solvent for the direct borylation of fluoroaromatics.
Reacts with alkynes to form siloles.
Undergoes the silylation of acid chlorides to give acylsilanes.

제조 방법

Hexamethyldisilane is produced by the reaction of methyl Grignard reagent with methylchlorodisilanes. This reaction is normally conducted in the presence of an ether such as diethyl ether, ethyl propyl ether, THF and the like.

화재위험

Hexamethyldisilazane (HMDZ) is a highly flammable liquid and vapour.
HMDZ liquid is lighter than water and may float on water, spreading material during fire fighting. Leaking material or fire runoff to sewer may create fire or explosion hazard.
HMDZ vapours are heavier than air and can accumulate to form explosive concentrations. The vapours may also spread a considerable distance to a source of ignition, and flash back towards the source.
HMDZ reacts with water to form ammonia.
HMDZ is a non-conductor and, therefore, can accumulate static electrical charges when processed, handled or dispensed. HMDZ's flash point is 52 to 53°F, closed cup, for "pure" material.

Purification Methods

The most likely impurity is trimethylchlorosilane (cf boiling point). Wash it with H2O, cold conc H2SO4, H2O again, then aqueous NaHCO3, dry over CaSO4 and fractionate at atmospheric pressure. [Brown & Fowles J Chem Soc 2811 1958.] A grossly impure sample (25% impurities) was purified by repeated spinning band distillation. This lowered the impurity level to 500ppm. The main impurity was identified as 1-hydroxypentamethyldisilane. [Beilstein 4 IV 4277.]

헥사메틸디실란 준비 용품 및 원자재

원자재

준비 용품


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