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ChemicalBook > Product Catalogue >Organic Chemistry >Organometallic compounds >Organic aluminum >TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)ALUMINUM

TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)ALUMINUM

TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)ALUMINUM Structure
  • ₹0
  • Product name: TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)ALUMINUM
  • CAS: 14319-08-5
  • MF: C33H57AlO6
  • MW: 576.78
  • EINECS:
  • MDL Number:MFCD00058918
  • Synonyms:Aluminum, tris(2,2,6,6-tetramethyl-3,5-heptanedionato)-;Aluminum, tris(2,2,6,6-tetramethyl-3,5-heptanedionato-O,O')-, (OC-6-11)-;Aluminum, tris(2,2,6-tetramethyl-3,5-heptanedionato-O,O')-, (OC-6-)-;Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)aluminum(III);TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)ALUMINUM;ALUMINUM TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE);ALUMINUM(III)2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONAT;ALUMINUM III 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE
Properties Safety Information Description
Manufacturer Product number Product description Packaging Price Updated Buy

Properties

Melting point :264-267 °C (lit.)
Boiling point :>400°C
Flash point :>400°C
form :crystal
color :white
Sensitive :Hygroscopic
Hydrolytic Sensitivity :4: no reaction with water under neutral conditions

Safety Information

Symbol(GHS): GHS hazard pictograms
Signal word: Warning
Hazard statements:
Code Hazard statements Hazard class Category Signal word Pictogram P-Codes
H315 Causes skin irritation Skin corrosion/irritation Category 2 Warning GHS hazard pictograms P264, P280, P302+P352, P321,P332+P313, P362
H319 Causes serious eye irritation Serious eye damage/eye irritation Category 2A Warning GHS hazard pictograms P264, P280, P305+P351+P338,P337+P313P
H335 May cause respiratory irritation Specific target organ toxicity, single exposure;Respiratory tract irritation Category 3 Warning GHS hazard pictograms
Precautionary statements:
P305+P351+P338 IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continuerinsing.

Description

Precursor for MOCVD applications

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