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TRIFLUOROMETHANESULFONIC ACID TRIFLUOROMETHYL ESTER

TRIFLUOROMETHANESULFONIC ACID TRIFLUOROMETHYL ESTER Structure
  • ₹0
  • Product name: TRIFLUOROMETHANESULFONIC ACID TRIFLUOROMETHYL ESTER
  • CAS: 3582-05-6
  • MF: C2F6O3S
  • MW: 218.07
  • EINECS:
  • MDL Number:MFCD04973017
  • Synonyms:methanesulfonicacid,trifluoro-,trifluoromethylester ;Trifluormethyl triflate;Trifluormethyl trifluoromethanesulfonate;TRIFLUOROMETHANESULFONIC ACID TRIFLUOROMETHYL ESTER;TrifluoroMethyltriflate;Methanesulfonicacid, 1,1,1-trifluoro-, trifluoroMethyl ester;Trifluoromethyl trifluoromethanesulphonate;rifluoromethyltrifluoromethanesulfonate
Manufacturer Product number Product description Packaging Price Updated Buy

Properties

Melting point :-108,2°C
Boiling point :21°C
Density :1.791±0.06 g/cm3(Predicted)
form :liquid
color :Clear
InChI :InChI=1S/C2F6O3S/c3-1(4,5)11-12(9,10)2(6,7)8
InChIKey :GVZFDPPAJXHNGL-UHFFFAOYSA-N
SMILES :C(F)(F)(F)S(OC(F)(F)F)(=O)=O
EPA Substance Registry System :Trifluoromethyl trifluoromethanesulfonate (3582-05-6)

Safety Information

Symbol(GHS): GHS hazard pictograms
Signal word: Danger
Hazard statements:
Code Hazard statements Hazard class Category Signal word Pictogram P-Codes
H314 Causes severe skin burns and eye damage Skin corrosion/irritation Category 1A, B, C Danger GHS hazard pictograms P260,P264, P280, P301+P330+ P331,P303+P361+P353, P363, P304+P340,P310, P321, P305+ P351+P338, P405,P501
Precautionary statements:
P260 Do not breathe dust/fume/gas/mist/vapours/spray.
P280 Wear protective gloves/protective clothing/eye protection/face protection.
P301+P330+P331 IF SWALLOWED: Rinse mouth. Do NOT induce vomiting.
P303+P361+P353 IF ON SKIN (or hair): Remove/Take off Immediately all contaminated clothing. Rinse SKIN with water/shower.
P304+P340 IF INHALED: Remove victim to fresh air and Keep at rest in a position comfortable for breathing.
P305+P351+P338 IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continuerinsing.

Description

Trifluoromethyl Triflate can be used for thermal atomic layer etching processes.

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