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ChemicalBook > Product Catalogue >Chemical Reagents >Organic reagents >Silane >Vinyltrimethylsilane

Vinyltrimethylsilane

Vinyltrimethylsilane Structure
  • ₹8530.1 - ₹111703.18
  • Product name: Vinyltrimethylsilane
  • CAS: 754-05-2
  • MF: C5H12Si
  • MW: 100.23
  • EINECS:212-042-9
  • MDL Number:MFCD00008606
  • Synonyms:CH2=CHSi(CH3)3;ethenyltrimethyl-silan ;Silane, trimethylvinyl-;silane,trimethylvinyl- ;Vinyltrimethysilane;VINYLTRIMETHYLSILANE;(TRIMETHYLSILYL)ETHYLENE;ETHENYLTRIMETHYLSILANE
5 prices
Selected condition:

Brand

  • TCI Chemicals (India)
  • Sigma-Aldrich(India)

Package

  • 5G
  • 25G
  • 25ML
  • 100G
  • 100ML
  • ManufacturerTCI Chemicals (India)
  • Product numberV0067
  • Product descriptionVinyltrimethylsilane min. 97.0 %
  • Packaging25ML
  • Price₹11000
  • Updated2022-05-26
  • Buy
  • ManufacturerTCI Chemicals (India)
  • Product numberV0067
  • Product descriptionVinyltrimethylsilane min. 97.0 %
  • Packaging100ML
  • Price₹29400
  • Updated2022-05-26
  • Buy
  • ManufacturerSigma-Aldrich(India)
  • Product number213950
  • Product descriptionVinyltrimethylsilane 97%
  • Packaging5G
  • Price₹8530.1
  • Updated2022-06-14
  • Buy
  • ManufacturerSigma-Aldrich(India)
  • Product number213950
  • Product descriptionVinyltrimethylsilane 97%
  • Packaging25G
  • Price₹21898.98
  • Updated2022-06-14
  • Buy
  • ManufacturerSigma-Aldrich(India)
  • Product number213950
  • Product descriptionVinyltrimethylsilane 97%
  • Packaging100G
  • Price₹111703.18
  • Updated2022-06-14
  • Buy
Manufacturer Product number Product description Packaging Price Updated Buy
TCI Chemicals (India) V0067 Vinyltrimethylsilane min. 97.0 % 25ML ₹11000 2022-05-26 Buy
TCI Chemicals (India) V0067 Vinyltrimethylsilane min. 97.0 % 100ML ₹29400 2022-05-26 Buy
Sigma-Aldrich(India) 213950 Vinyltrimethylsilane 97% 5G ₹8530.1 2022-06-14 Buy
Sigma-Aldrich(India) 213950 Vinyltrimethylsilane 97% 25G ₹21898.98 2022-06-14 Buy
Sigma-Aldrich(India) 213950 Vinyltrimethylsilane 97% 100G ₹111703.18 2022-06-14 Buy

Properties

Melting point :-132°C
Boiling point :55 °C (lit.)
Density :0.684 g/mL at 25 °C (lit.)
vapor pressure :4.44 psi ( 20 °C)
refractive index :n20/D 1.391(lit.)
Flash point :<-30 °C
storage temp. :Inert atmosphere,2-8°C
solubility :Miscible with tetrahydrofuran, diethyl ether, benzene and dichloromethane.
form :liquid
Specific Gravity :0.6903
color :Colorless to Almost colorless
Hydrolytic Sensitivity :1: no significant reaction with aqueous systems
BRN :956572
InChIKey :GCSJLQSCSDMKTP-UHFFFAOYSA-N
CAS DataBase Reference :754-05-2(CAS DataBase Reference)
NIST Chemistry Reference :Silane, ethenyltrimethyl-(754-05-2)
EPA Substance Registry System :Silane, ethenyltrimethyl- (754-05-2)

Safety Information

Symbol(GHS): GHS hazard pictogramsGHS hazard pictogramsGHS hazard pictograms
Signal word: Danger
Hazard statements:
Code Hazard statements Hazard class Category Signal word Pictogram P-Codes
H225 Highly Flammable liquid and vapour Flammable liquids Category 2 Danger GHS hazard pictograms P210,P233, P240, P241, P242, P243,P280, P303+ P361+P353, P370+P378,P403+P235, P501
H315 Causes skin irritation Skin corrosion/irritation Category 2 Warning GHS hazard pictograms P264, P280, P302+P352, P321,P332+P313, P362
H319 Causes serious eye irritation Serious eye damage/eye irritation Category 2A Warning GHS hazard pictograms P264, P280, P305+P351+P338,P337+P313P
H351 Suspected of causing cancer Carcinogenicity Category 2 Warning P201, P202, P281, P308+P313, P405,P501
Precautionary statements:
P202 Do not handle until all safety precautions have been read and understood.
P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking.
P233 Keep container tightly closed.
P303+P361+P353 IF ON SKIN (or hair): Remove/Take off Immediately all contaminated clothing. Rinse SKIN with water/shower.
P305+P351+P338 IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continuerinsing.
P308+P313 IF exposed or concerned: Get medical advice/attention.

Description

Vinyltrimethylsilane is used in semiconductor processing. It is involved in the Preparation of silyl-ethers by Rh(I) catalysis. Further, it is used in the preparation of trimethylsilylethyl sulfoxides which in the presence of fluoride ion generate sulfenate nucleophiles.

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