1,1,3,3-Tetramethyldisilazane
- CAS No.
- 15933-59-2
- Chemical Name:
- 1,1,3,3-Tetramethyldisilazane
- Synonyms
- TMDS;Bis(dimethylsilyl)amine;TETRAMETHYLDISILAZANE;Bisdimethylsilylamine;DK097;Bis(dimethylsilyl) imide;Iminobis(dimethylsilane);TETRAMETHYLDISILAZANE 98+%;1,1,3,3-TETRAMETHYLDISILAZANE;Disilazane, 1,1,3,3-tetramethyl-
- CBNumber:
- CB7776616
- Molecular Formula:
- C4H15NSi2
- Molecular Weight:
- 133.34
- MOL File:
- 15933-59-2.mol
- MSDS File:
- SDS
- Modify Date:
- 2024/3/27 18:00:30
| Melting point | 99-100 °C |
|---|---|
| Boiling point | 99-100 °C |
| Density | 0.752 g/mL at 25 °C(lit.) |
| refractive index |
n |
| Flash point | 17 °F |
| storage temp. | Store below +30°C. |
| solubility | Miscible with common organic solvents. |
| pka | 9.80±0.70(Predicted) |
| form | clear liquid |
| color | Colorless to Almost colorless |
| Specific Gravity | 0.752 |
| Sensitive | Moisture Sensitive |
| Hydrolytic Sensitivity | 7: reacts slowly with moisture/water |
| BRN | 741869 |
| CAS DataBase Reference | 15933-59-2(CAS DataBase Reference) |
| EPA Substance Registry System | Silanamine, N-(dimethylsilyl)-1,1-dimethyl- (15933-59-2) |
SAFETY
Risk and Safety Statements
| Symbol(GHS) |   GHS02,GHS07 |
|||||||||
|---|---|---|---|---|---|---|---|---|---|---|
| Signal word | Danger | |||||||||
| Hazard statements | H225-H315-H319-H335 | |||||||||
| Precautionary statements | P210-P302+P352-P305+P351+P338 | |||||||||
| Hazard Codes | F,Xi | |||||||||
| Risk Statements | 11-36/37/38 | |||||||||
| Safety Statements | 16-26-36 | |||||||||
| RIDADR | UN 2924 3/PG 2 | |||||||||
| WGK Germany | 3 | |||||||||
| F | 10-21 | |||||||||
| TSCA | Yes | |||||||||
| HazardClass | 3 | |||||||||
| PackingGroup | II | |||||||||
| HS Code | 29319090 | |||||||||
| NFPA 704 |
|
1,1,3,3-Tetramethyldisilazane price More Price(6)
| Manufacturer | Product number | Product description | CAS number | Packaging | Price | Updated | Buy |
|---|---|---|---|---|---|---|---|
| Sigma-Aldrich | 139246 | 1,1,3,3-Tetramethyldisilazane 97% | 15933-59-2 | 10G | ₹4351.65 | 2022-06-14 | Buy |
| Sigma-Aldrich(India) | 139246 | 1,1,3,3-Tetramethyldisilazane 97% | 15933-59-2 | 10G | ₹4351.65 | 2022-06-14 | Buy |
| TCI Chemicals (India) | T0833 | 1,1,3,3-Tetramethyldisilazane min. 97.0 % | 15933-59-2 | 5ML | ₹2600 | 2022-05-26 | Buy |
| TCI Chemicals (India) | T0833 | 1,1,3,3-Tetramethyldisilazane min. 97.0 % | 15933-59-2 | 25ML | ₹7700 | 2022-05-26 | Buy |
| ALFA India | ALF-A14304-18 | Tetramethyldisilazane, 97% | 15933-59-2 | 50g | ₹24853 | 2022-05-26 | Buy |
1,1,3,3-Tetramethyldisilazane Chemical Properties,Uses,Production
Chemical Properties
Clear colorless to faintly yellow liquid
Physical properties
bp 99–100 °C; n20 D 1.4040; d 0.752 g cm?3.
Uses
1,1,3,3-Tetramethyldisilazane is widely used in intramolecular hydrosilation of allyl alcohols, homoallyl alcohols, and homopropargyl alcohols for the regio- and stereoselective synthesis of polyols
Properties and Applications
The ICP CVD synthesis of SiCxNy: H thin films using 1,1,3,3-tetramethyldisilazane (TMDSZ ) as a single-source precursor and argon as a gas-activator[1]. Using TMDSZ as the single-source compound produced amorphous hydrogenated silicon carbonitride (a-SiCN: H) films, whereas no such films were formed when HMDSZ was used, which was attributed to the lack of Si–H bond in HMDSZ. Under the collision-free condition, the formation of ?CH3, NH3, and DMSA was demonstrated from the decomposition of TMDSZ on the heated W filament. Free-radical short-chain reactions dominate the secondary gas-phase reactions of TMDSZ in the reactor setup. The short-chain reaction is initiated by the formation of methyl radicals via the cleavage of the Si–CH3 bonds of TMDSZ. The H abstraction by the produced methyl radicals from the Si–H or the C–H bond in various stable molecules (e.g., TMDSZ) propagates the chain with a resulting radical, which recombines with another radical to terminate the chain reactions, producing a series of products in the high-mass region[2].
References
[1] Maksim N. Chagin. “Synthesis, Properties and Aging of ICP-CVD SiCxNy:H Films Formed from Tetramethyldisilazane.” Coatings (2022).
[2] James Michael Stevenson, Eric Ampong and Yujun Shi*. “Understanding the Reaction Chemistry of 1,1,3,3-Tetramethyldisilazane as a Precursor Gas in a Catalytic Chemical Vapor Deposition Process.” The Journal of Physical Chemistry A 127 44 (2023): 9185–9195.
1,1,3,3-Tetramethyldisilazane Preparation Products And Raw materials
Raw materials
Preparation Products
| Supplier | Tel | Country | ProdList | Advantage | Inquiry |
|---|---|---|---|---|---|
| TCI Chemicals (India) Pvt. Ltd. | 1800 425 7889 | New Delhi, India | 6778 | 58 | Inquiry |
| Alfa Aesar | 1 800 209 7001 | Maharashtra, India | 6913 | 58 | Inquiry |
| Dongguan City Betterly New Materials co.,Ltd | +86-13713468294 +86-13535083564 | China | 38 | 58 | Inquiry |
| Henan Fengda Chemical Co., Ltd | +86-371-86557731 +86-13613820652 | China | 20361 | 58 | Inquiry |
| Shanghai Daken Advanced Materials Co.,Ltd | +86-371-66670886 | China | 16220 | 58 | Inquiry |
| Henan Tianfu Chemical Co.,Ltd. | +86-0371-55170693 +86-19937530512 | China | 21676 | 55 | Inquiry |
| ATK CHEMICAL COMPANY LIMITED | +undefined-21-51877795 | China | 32760 | 60 | Inquiry |
| career henan chemical co | +86-0371-86658258 +8613203830695 | China | 29901 | 58 | Inquiry |
| Xi'an Kono chem co., Ltd., | 029-86107037 13289246953 | China | 2995 | 58 | Inquiry |
| Chongqing Chemdad Co., Ltd | +86-023-6139-8061 +86-86-13650506873 | China | 39916 | 58 | Inquiry |
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