PSS-(1-PROPYLMETHACRYLATE)-HEPTAISOBUTY&
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- ₹12838.45
- Product name: PSS-(1-PROPYLMETHACRYLATE)-HEPTAISOBUTY&
- CAS: 307531-94-8
- MF: C35H74O14Si8
- MW: 943.64
- EINECS:
- MDL Number:MFCD02683452
- Synonyms:PSS-(1-PROPYLMETHACRYLATE)-HEPTAISOBUTY&;3-(3,5,-HEPTAISOBUTYLPENTACYCLO(9.5(3,9);3-(3,5,7,9,11,13,15-heptaisobutylpentacyclo[9.5.13,9.15,15.17,13]octasiloxan-1-yl)propylmethacrylate;pss-(1-propylmethacrylate)-heptaisobutyl substituted;Methacrylolsobutyl POSS;METHACRYLOXYPROPYL SUBSTITUTED POLY(ISOBUTYLSILSESQUIOXANE;METHACRYLOXYPROPYLHEPTAISOBUTYL-T8-SILSESQUIOXANE, tech-95;MethacryloIsobutyl POSS
1 prices
Selected condition:
Brand
- Sigma-Aldrich(India)
Package
- 5G
- ManufacturerSigma-Aldrich(India)
- Product number534633
- Product descriptionPSS-(1-Propylmethacrylate)-Heptaisobutyl substituted
- Packaging5G
- Price₹12838.45
- Updated2022-06-14
- Buy
Manufacturer | Product number | Product description | Packaging | Price | Updated | Buy |
---|---|---|---|---|---|---|
Sigma-Aldrich(India) | 534633 | PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted | 5G | ₹12838.45 | 2022-06-14 | Buy |
Properties
Melting point :108-112 °C(lit.)
Boiling point :>205°C
Density :1.09±0.1 g/cm3(Predicted)
Flash point :>230 °F
storage temp. :below 5° C
Hydrolytic Sensitivity :3: reacts with aqueous base
Boiling point :>205°C
Density :1.09±0.1 g/cm3(Predicted)
Flash point :>230 °F
storage temp. :below 5° C
Hydrolytic Sensitivity :3: reacts with aqueous base
Safety Information
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Description
PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted can be used as a functional monomer to prepare molecularly imprinted polymers or hybrid monolithic materials (MIPs) via reversible addition-fragmentation chain transfer polymerization (RAFT) or thermally initiated free radical polymerization reactions using suitable template molecules, cross-linker, porogenic solvent, and initiator. The resulting polymeric materials exhibited excellent polymer properties such as high thermal stability, high mechanical stability, low inflammability surface hardening, and oxidation resistance. These POSS nanostructural polymeric materials are commonly used in various biomedical applications, drug delivery, imaging reagents, catalyst supports, enzyme-like catalysis, solid-phase extraction, sensors, and in the chromatographic stationary phase.Related product price
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