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ChemicalBook > Product Catalogue >Chemical Reagents >Silane reagent >Silicon Tetrafluoride

Silicon Tetrafluoride

Silicon Tetrafluoride Structure
  • ₹0
  • Product name: Silicon Tetrafluoride
  • CAS: 7783-61-1
  • MF: F4Si
  • MW: 104.08
  • EINECS:232-015-5
  • MDL Number:MFCD00040533
  • Synonyms:SILICON TETRAFLUORIDE;SILICIUM TETRAFLUORIDE;Silicon fluoride;SILICON (IV) FLUORIDE;TETRAFLUOROSILANE;SILICON TETRAFLUORIDE, 99.99+%, ELECTRON;Silicon tetrafluoride 99.5%;TETRAFLUOROSILANE: 99.99%
Properties Safety Information Description
Manufacturer Product number Product description Packaging Price Updated Buy

Properties

Melting point :-90°C
Boiling point :-86 °C
Density :1.66
vapor pressure :3517.191kPa at 25℃
solubility :reacts with H2O
form :colorless gas
color :colorless
Specific Gravity :1.66
Water Solubility :hydrolyzed by H2O [AIR87]
Hydrolytic Sensitivity :8: reacts rapidly with moisture, water, protic solvents
Merck :13,8575
CAS DataBase Reference :7783-61-1(CAS DataBase Reference)
EPA Substance Registry System :Silane, tetrafluoro- (7783-61-1)

Safety Information

Symbol(GHS): GHS hazard pictogramsGHS hazard pictograms
Signal word: Danger
Hazard statements:
Code Hazard statements Hazard class Category Signal word Pictogram P-Codes
H314 Causes severe skin burns and eye damage Skin corrosion/irritation Category 1A, B, C Danger GHS hazard pictograms P260,P264, P280, P301+P330+ P331,P303+P361+P353, P363, P304+P340,P310, P321, P305+ P351+P338, P405,P501
Precautionary statements:
P260 Do not breathe dust/fume/gas/mist/vapours/spray.
P264 Wash hands thoroughly after handling.
P264 Wash skin thouroughly after handling.
P280 Wear protective gloves/protective clothing/eye protection/face protection.
P284 Wear respiratory protection.
P301+P310 IF SWALLOWED: Immediately call a POISON CENTER or doctor/physician.
P302+P350 IF ON SKIN: Gently wash with plenty of soap and water.

Description

Silicon tetrafluoride is used in ion-implantation processes and as a precursor to fluorinated silica via plasma-assisted CVD. Mixtures of SiF4-SiH4-H2have recently been used to deposit polycrystalline silicon thin films via remote plasma chemical vapor deposition (RPCVD).Such fluorinated thin films show visible photoluminescence (PL) at room temperature.

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Potassium fluorosilicate LITHIUM HEXAFLUOROSILICATE Silicon Tetrafluoride Hexafluorosilicic acid Sodium fluorosilicate

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Suppliers and manufacturers

Shanghai Daken Advanced Materials Co.,Ltd
BEYOND INDUSTRIES (CHINA) LIMITED
Hefei TNJ Chemical Industry Co.,Ltd.
CD Chemical Group Limited
Shaanxi Didu New Materials Co. Ltd
SUZHOU SENFEIDA CHEMICAL CO.,LTD
Henan Allgreen Chemical Co.,LTD
XIAMEN AMITY INDUSTRY AND TRADE CO., LTD. ABCR GmbH & CO. KG Ereztech LLC