TRI-T-BUTOXYSILANOL
- ₹6646.55 - ₹79639.53
- Product name: TRI-T-BUTOXYSILANOL
- CAS: 18166-43-3
- MF: C12H28O4Si
- MW: 264.43
- EINECS:
- MDL Number:MFCD00271024
- Synonyms:TRI-T-BUTOXYSILANOL;TRIS(TERT-BUTOXY)SILANOL;TRIS(T-BUTOXY)SILANOL;Tri-tert-butoxysilanol;Tri-tert-butyl hydrogen orthosilicate;Tri-t-butoxysilanol (99.999%-Si) PURATREM;Tri-t-butoxysilanol (99.999%-Si) PURATREM 14-7015 contained in 50 Ml Swagelokcylinder (96-1077) for CVD/ALD;Tris(tert-butoxy)silanol 99.999%
3 prices
Selected condition:
Brand
- Sigma-Aldrich(India)
Package
- 5G
- 25G
- ManufacturerSigma-Aldrich(India)
- Product number697281
- Product descriptionTris(tert-butoxy)silanol packaged for use in deposition systems
- Packaging25G
- Price₹79639.53
- Updated2022-06-14
- Buy
- ManufacturerSigma-Aldrich(India)
- Product number553468
- Product descriptionTris(tert-butoxy)silanol 99.999%
- Packaging25G
- Price₹22451.05
- Updated2022-06-14
- Buy
- ManufacturerSigma-Aldrich(India)
- Product number553468
- Product descriptionTris(tert-butoxy)silanol 99.999%
- Packaging5G
- Price₹6646.55
- Updated2022-06-14
- Buy
Manufacturer | Product number | Product description | Packaging | Price | Updated | Buy |
---|---|---|---|---|---|---|
Sigma-Aldrich(India) | 697281 | Tris(tert-butoxy)silanol packaged for use in deposition systems | 25G | ₹79639.53 | 2022-06-14 | Buy |
Sigma-Aldrich(India) | 553468 | Tris(tert-butoxy)silanol 99.999% | 25G | ₹22451.05 | 2022-06-14 | Buy |
Sigma-Aldrich(India) | 553468 | Tris(tert-butoxy)silanol 99.999% | 5G | ₹6646.55 | 2022-06-14 | Buy |
Properties
Melting point :63-65 °C(lit.)
Boiling point :205-210 °C(lit.)
Density :0,92 g/cm3
Flash point :>65°C
storage temp. :Inert atmosphere,Room Temperature
form :solid
pka :11.78±0.53(Predicted)
Hydrolytic Sensitivity :7: reacts slowly with moisture/water
Sensitive :moisture sensitive
Boiling point :205-210 °C(lit.)
Density :0,92 g/cm3
Flash point :>65°C
storage temp. :Inert atmosphere,Room Temperature
form :solid
pka :11.78±0.53(Predicted)
Hydrolytic Sensitivity :7: reacts slowly with moisture/water
Sensitive :moisture sensitive
Safety Information
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Description
Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films.Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.More related product prices
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