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ChemicalBook > Product Catalogue >Organic Chemistry >Organometallic compounds >Organic hafnium, silver, platinum >HAFNIUM TERT-BUTOXIDE

HAFNIUM TERT-BUTOXIDE

HAFNIUM TERT-BUTOXIDE Structure
  • ₹23049 - ₹76965.75
  • Product name: HAFNIUM TERT-BUTOXIDE
  • CAS: 2172-02-3
  • MF: C16H36HfO4
  • MW: 470.94
  • EINECS:
  • MDL Number:MFCD00070458
  • Synonyms:HAFNIUM (IV) T-BUTOXIDE;HAFNIUM T-BUTOXIDE;HAFNIUM TERT-BUTOXIDE;HAFNIUM TETRA-T-BUTOXIDE;Hafnium(IV) t-butoxide (99.9%-Hf);Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%;Hafnium(IV) tert-butoxide;Hafnium(IV) tert-butoxide, 99.9% trace metals basis excluding Zr
3 prices
Selected condition:

Brand

  • Sigma-Aldrich(India)
  • ottokemi

Package

  • 5gm
  • 5G
  • 10G
  • ManufacturerSigma-Aldrich(India)
  • Product number445541
  • Product descriptionHafnium(IV) tert-butoxide 99.99% trace metals basis (purity excludes ~2000 ppm zirconium.)
  • Packaging5G
  • Price₹23468.6
  • Updated2022-06-14
  • Buy
  • ManufacturerSigma-Aldrich(India)
  • Product number760463
  • Product descriptionHafnium(IV) tert-butoxide packaged for use in deposition systems
  • Packaging10G
  • Price₹76965.75
  • Updated2022-06-14
  • Buy
  • Manufacturerottokemi
  • Product number H 3124
  • Product descriptionHafnium tert-butoxide 99.99%
  • Packaging5gm
  • Price₹23049
  • Updated2022-05-26
  • Buy
Manufacturer Product number Product description Packaging Price Updated Buy
Sigma-Aldrich(India) 445541 Hafnium(IV) tert-butoxide 99.99% trace metals basis (purity excludes ~2000 ppm zirconium.) 5G ₹23468.6 2022-06-14 Buy
Sigma-Aldrich(India) 760463 Hafnium(IV) tert-butoxide packaged for use in deposition systems 10G ₹76965.75 2022-06-14 Buy
ottokemi H 3124 Hafnium tert-butoxide 99.99% 5gm ₹23049 2022-05-26 Buy

Properties

Melting point :2℃
Boiling point :90 °C5 mm Hg(lit.)
Density :1.166 g/mL at 25 °C(lit.)
refractive index :n20/D 1.424(lit.)
Flash point :83 °F
solubility :Soluble in hydrocarbons, reacts with alcohols, ketones, and esters
form :Liquid
Specific Gravity :1.166
Hydrolytic Sensitivity :7: reacts slowly with moisture/water
Sensitive :Moisture Sensitive/Light Sensitive
Exposure limits :ACGIH: TWA 0.5 mg/m3
NIOSH: IDLH 50 mg/m3; TWA 0.5 mg/m3 CAS DataBase Reference :2172-02-3(CAS DataBase Reference)

Safety Information

Symbol(GHS): GHS hazard pictogramsGHS hazard pictograms
Signal word: Warning
Hazard statements:
Code Hazard statements Hazard class Category Signal word Pictogram P-Codes
H226 Flammable liquid and vapour Flammable liquids Category 3 Warning
H315 Causes skin irritation Skin corrosion/irritation Category 2 Warning GHS hazard pictograms P264, P280, P302+P352, P321,P332+P313, P362
H319 Causes serious eye irritation Serious eye damage/eye irritation Category 2A Warning GHS hazard pictograms P264, P280, P305+P351+P338,P337+P313P
H335 May cause respiratory irritation Specific target organ toxicity, single exposure;Respiratory tract irritation Category 3 Warning GHS hazard pictograms
Precautionary statements:
P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking.
P302+P352 IF ON SKIN: wash with plenty of soap and water.
P305+P351+P338 IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continuerinsing.

Description

Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.

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