HAFNIUM TERT-BUTOXIDE
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- ₹23049 - ₹76965.75
- Product name: HAFNIUM TERT-BUTOXIDE
- CAS: 2172-02-3
- MF: C16H36HfO4
- MW: 470.94
- EINECS:
- MDL Number:MFCD00070458
- Synonyms:HAFNIUM (IV) T-BUTOXIDE;HAFNIUM T-BUTOXIDE;HAFNIUM TERT-BUTOXIDE;HAFNIUM TETRA-T-BUTOXIDE;Hafnium(IV) t-butoxide (99.9%-Hf);Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%;Hafnium(IV) tert-butoxide;Hafnium(IV) tert-butoxide, 99.9% trace metals basis excluding Zr
3 prices
Selected condition:
Brand
- Sigma-Aldrich(India)
- ottokemi
Package
- 5gm
- 5G
- 10G
- ManufacturerSigma-Aldrich(India)
- Product number760463
- Product descriptionHafnium(IV) tert-butoxide packaged for use in deposition systems
- Packaging10G
- Price₹76965.75
- Updated2022-06-14
- Buy
- ManufacturerSigma-Aldrich(India)
- Product number445541
- Product descriptionHafnium(IV) tert-butoxide 99.99% trace metals basis (purity excludes ~2000 ppm zirconium.)
- Packaging5G
- Price₹23468.6
- Updated2022-06-14
- Buy
- Manufacturerottokemi
- Product number H 3124
- Product descriptionHafnium tert-butoxide 99.99%
- Packaging5gm
- Price₹23049
- Updated2022-05-26
- Buy
Manufacturer | Product number | Product description | Packaging | Price | Updated | Buy |
---|---|---|---|---|---|---|
Sigma-Aldrich(India) | 760463 | Hafnium(IV) tert-butoxide packaged for use in deposition systems | 10G | ₹76965.75 | 2022-06-14 | Buy |
Sigma-Aldrich(India) | 445541 | Hafnium(IV) tert-butoxide 99.99% trace metals basis (purity excludes ~2000 ppm zirconium.) | 5G | ₹23468.6 | 2022-06-14 | Buy |
ottokemi | H 3124 | Hafnium tert-butoxide 99.99% | 5gm | ₹23049 | 2022-05-26 | Buy |
Properties
Melting point :2℃
Boiling point :90 °C5 mm Hg(lit.)
Density :1.166 g/mL at 25 °C(lit.)
refractive index :n20/D 1.424(lit.)
Flash point :83 °F
solubility :Soluble in hydrocarbons, reacts with alcohols, ketones, and esters
form :Liquid
Specific Gravity :1.166
Hydrolytic Sensitivity :7: reacts slowly with moisture/water
Sensitive :Moisture Sensitive/Light Sensitive
Exposure limits :ACGIH: TWA 0.5 mg/m3
NIOSH: IDLH 50 mg/m3; TWA 0.5 mg/m3 CAS DataBase Reference :2172-02-3(CAS DataBase Reference)
Boiling point :90 °C5 mm Hg(lit.)
Density :1.166 g/mL at 25 °C(lit.)
refractive index :n
Flash point :83 °F
solubility :Soluble in hydrocarbons, reacts with alcohols, ketones, and esters
form :Liquid
Specific Gravity :1.166
Hydrolytic Sensitivity :7: reacts slowly with moisture/water
Sensitive :Moisture Sensitive/Light Sensitive
Exposure limits :ACGIH: TWA 0.5 mg/m3
NIOSH: IDLH 50 mg/m3; TWA 0.5 mg/m3 CAS DataBase Reference :2172-02-3(CAS DataBase Reference)
Safety Information
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Description
Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.Related product price
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