Hexafluoroethane
|
- ₹0
- Product name: Hexafluoroethane
- CAS: 76-16-4
- MF: C2F6
- MW: 138.01
- EINECS:200-939-8
- MDL Number:MFCD00000428
- Synonyms:freon116 ;Hexafluorethan ;hexafluoro-ethan ;Perfluorocarbon116 ;PFC116 ;R 116;r116 ;R-116
| Manufacturer | Product number | Product description | Packaging | Price | Updated | Buy |
|---|
Properties
Melting point :−100 °C(lit.)
Boiling point :−78 °C(lit.)
Density :1,607 g/cm3
vapor density :4.7 (vs air)
vapor pressure :430 psi ( 21 °C)
refractive index :1.2060
InChIKey :WMIYKQLTONQJES-UHFFFAOYSA-N
CAS DataBase Reference :76-16-4(CAS DataBase Reference)
EPA Substance Registry System :Hexafluoroethane (76-16-4)
Boiling point :−78 °C(lit.)
Density :1,607 g/cm3
vapor density :4.7 (vs air)
vapor pressure :430 psi ( 21 °C)
refractive index :1.2060
InChIKey :WMIYKQLTONQJES-UHFFFAOYSA-N
CAS DataBase Reference :76-16-4(CAS DataBase Reference)
EPA Substance Registry System :Hexafluoroethane (76-16-4)
Safety Information
| Symbol(GHS): |
|
||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Signal word: | Warning | ||||||||||||||
| Hazard statements: |
|
||||||||||||||
| Precautionary statements: |
|
Description
Hexafluoroethane is used as a versatile etchant in semiconductor manufacturing. It can be used for selective etching of metal silicides and oxides versus their metal substrates and also for etching of silicon dioxide over silicon. The primary aluminium and the semiconductor manufacturing industries are the major emitters of hexafluoroethane using the Hall-Héroult process.More related product prices
Octafluorocyclobutane PERFLUORO-N-PENTANE Carbon tetrafluoride Hexafluoropropylene HEXAFLUOROETHANERelated product price
- Hexafluoropropylene
₹160299
